JPWO2008114410A1 - 全有機体炭素測定装置 - Google Patents
全有機体炭素測定装置 Download PDFInfo
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- JPWO2008114410A1 JPWO2008114410A1 JP2009505009A JP2009505009A JPWO2008114410A1 JP WO2008114410 A1 JPWO2008114410 A1 JP WO2008114410A1 JP 2009505009 A JP2009505009 A JP 2009505009A JP 2009505009 A JP2009505009 A JP 2009505009A JP WO2008114410 A1 JPWO2008114410 A1 JP WO2008114410A1
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 218
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 149
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 73
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 73
- 238000005259 measurement Methods 0.000 claims abstract description 68
- 239000005416 organic matter Substances 0.000 claims abstract description 30
- 238000000926 separation method Methods 0.000 claims abstract description 30
- 230000003647 oxidation Effects 0.000 claims abstract description 29
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 29
- 238000012545 processing Methods 0.000 claims abstract description 12
- 238000006864 oxidative decomposition reaction Methods 0.000 claims abstract description 6
- 238000011071 total organic carbon measurement Methods 0.000 claims abstract description 5
- 239000012528 membrane Substances 0.000 claims description 32
- 239000007788 liquid Substances 0.000 claims description 14
- 230000007935 neutral effect Effects 0.000 claims description 10
- 239000007853 buffer solution Substances 0.000 claims description 2
- 238000012840 feeding operation Methods 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 abstract description 5
- 239000000758 substrate Substances 0.000 description 46
- 239000007789 gas Substances 0.000 description 44
- 239000010408 film Substances 0.000 description 43
- 239000010453 quartz Substances 0.000 description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 21
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 description 13
- 238000000034 method Methods 0.000 description 11
- 230000005855 radiation Effects 0.000 description 11
- 239000000126 substance Substances 0.000 description 11
- 238000005342 ion exchange Methods 0.000 description 10
- 239000005703 Trimethylamine hydrochloride Substances 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 239000004205 dimethyl polysiloxane Substances 0.000 description 8
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 8
- SZYJELPVAFJOGJ-UHFFFAOYSA-N trimethylamine hydrochloride Chemical compound Cl.CN(C)C SZYJELPVAFJOGJ-UHFFFAOYSA-N 0.000 description 8
- IWZKICVEHNUQTL-UHFFFAOYSA-M potassium hydrogen phthalate Chemical compound [K+].OC(=O)C1=CC=CC=C1C([O-])=O IWZKICVEHNUQTL-UHFFFAOYSA-M 0.000 description 7
- 238000009826 distribution Methods 0.000 description 6
- 229920006367 Neoflon Polymers 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 5
- 238000007599 discharging Methods 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- -1 nitrite ions Chemical class 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 229920006129 ethylene fluorinated ethylene propylene Polymers 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000002452 interceptive effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910017464 nitrogen compound Inorganic materials 0.000 description 3
- 150000002830 nitrogen compounds Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000009279 wet oxidation reaction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000010525 oxidative degradation reaction Methods 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 239000008238 pharmaceutical water Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229940005654 nitrite ion Drugs 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/18—Water
- G01N33/1826—Organic contamination in water
- G01N33/1846—Total carbon analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/06—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a liquid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/23—Carbon containing
- Y10T436/235—In an aqueous solution [e.g., TOC, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/25—Chemistry: analytical and immunological testing including sample preparation
- Y10T436/2575—Volumetric liquid transfer
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- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Abstract
Description
全有機体炭素測定装置には、高温の炉で有機物を燃焼酸化する燃焼式酸化法や、紫外光と酸化剤を用いて有機物を化学的に酸化する湿式酸化法があるが、純水や超純水のような高感度測定には後者の湿式酸化法が一般的である。
また、本発明者らはマイクロ加工技術を用いてデバイスを集積化することで、試料水や試料水消費量の低減と配管からの溶出や透過の低減を両立する全有機体炭素測定装置を開発し、従来の装置よりも少ない容量の水を測定することを提案してきた(特許文献4参照。)。
4 中間水流路
6 測定水流路
8,10 ガス透過膜
20 二酸化炭素分離部
24 有機物酸化部
34 導電率測定部制御部
40 制御部
41 データ処理部
42 送液装置
64 試料水導入口
66 試料水排出口
図1は全有機体炭素測定装置の一実施例を模式的に示す断面図である。この全有機体炭素測定装置は、有機物酸化部24、二酸化炭素分離部20及び導電率測定部34を一体化して集積した計測部と、計測部に試料水を送液する送液装置42と、送液装置42を制御する制御部40と、導電率値に基づいてTOC値を求めるデータ処理部41とを備えている。なお、各基板の表面と裏面を区別して呼ぶときは、図1の状態で上側の面を「表面」、下側の面を「裏面」と呼ぶ。
ガス透過膜8,10の間にはPDMSフィルム98が挟みこまれ、そのPDMSフィルム98の厚みによって隙間が形成され、そのPDMSフィルム98のパターンによって中間水流路4が形成されている。中間水流路4は一端が石英基板80の中間水導入用の中間水分岐流路86につながり、他端が中間水排出用の貫通穴88につながる形状に形成されている。
Claims (6)
- 供給された試料水に紫外線が照射されて試料水中の有機物を酸化して二酸化炭素に変換する有機物酸化部と、前記有機物酸化部を経た試料水が流される試料水流路及び脱イオン水からなる測定水が流される測定水流路を備えた二酸化炭素分離部と、前記二酸化炭素分離部からの測定水の導電率を測定する導電率測定部と、を備え、前記二酸化炭素分離部は前記試料水流路と前記測定水流路の間がガス透過可能に接し、且つ上から順に積層されて一体化されており、前記各部が上から順に積層された計測部と、
前記計測部での送液動作を制御する制御部と、
測定水の導電率から全有機体炭素濃度を求めるデータ処理部と、を備え、
前記制御部は有機物を酸化する時は試料水の送液を停止し、試料水を前記有機物酸化分解部及び前記二酸化炭素分離部へ移動させる時に試料水の送液を行ない、
前記データ処理部は相対強度が一定値以上の紫外光が照射された試料水が前記二酸化炭素分離部へ到達している時の導電率に基づいて全有機体炭素濃度を測定するものである全有機体炭素測定装置。 - 前記二酸化炭素分離部は、前記試料水流路と前記測定水流路の間に、前記試料水流路を流れる試料水よりも高いpH値をもつ中性領域の中間水が存在する中間水流路を備え、
前記試料水流路と前記中間水流路の間及び前記中間水流路と前記測定水流路の間がそれぞれガス透過膜を介して接し、且つ前記試料水流路、前記中間水流路及び前記測定水流路が上から順に積層されて一体化されている請求項1に記載の全有機体炭素測定装置。 - 前記試料水流路は、前記ガス透過膜と接する部分が流路長を長くするために蛇行している請求項1又は2に記載の全有機体炭素測定装置。
- 前記測定水流路は、前記ガス透過膜と接する部分が流路長を長くするために蛇行している請求項1から3のいずれか一項に記載の全有機体炭素測定装置。
- 前記中間水流路は、前記ガス透過膜と接する部分が流路長を長くするために蛇行している請求項2から4のいずれか一項に記載の全有機体炭素測定装置。
- 中間水としてpHが中性領域に設定された緩衝液を用いる請求項2から5のいずれか一項に記載の全有機体炭素測定装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/055653 WO2008114410A1 (ja) | 2007-03-20 | 2007-03-20 | 全有機体炭素測定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2008114410A1 true JPWO2008114410A1 (ja) | 2010-07-01 |
JP4983914B2 JP4983914B2 (ja) | 2012-07-25 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009505009A Expired - Fee Related JP4983914B2 (ja) | 2007-03-20 | 2007-03-20 | 全有機体炭素測定装置 |
Country Status (5)
Country | Link |
---|---|
US (2) | US20100034702A1 (ja) |
EP (1) | EP2136205B1 (ja) |
JP (1) | JP4983914B2 (ja) |
CN (1) | CN101636652B (ja) |
WO (1) | WO2008114410A1 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2951272B1 (fr) * | 2009-10-09 | 2011-12-09 | Millipore Corp | Methode de calibration d'un dispositif de mesure de la teneur en carbone organique total |
DE102011004806A1 (de) * | 2011-02-28 | 2012-08-30 | Siemens Aktiengesellschaft | Magnetische Durchflusszytometrie für hohen Probendurchsatz |
DE102011004805A1 (de) * | 2011-02-28 | 2012-08-30 | Siemens Aktiengesellschaft | Miniaturisierte magnetische Durchflusszytometrie |
JP5941553B2 (ja) * | 2012-01-09 | 2016-06-29 | ゼネラル・エレクトリック・カンパニイ | 室温における全有機体炭素(toc)分析器のための酸性化されてない標準のtocレベルを安定化する方法 |
EP2803996A1 (fr) * | 2013-05-15 | 2014-11-19 | Merck Patent GmbH | Dispositif de mesure de conductivité d'un liquide pour déterminer de très bas niveaux de carbone organique total (TOC) dans de l'eau pure et ultra-pure |
EP2878947A1 (en) | 2013-12-02 | 2015-06-03 | Geoservices Equipements | Isothermal analysis system and method |
CN105716927A (zh) * | 2014-12-03 | 2016-06-29 | 通用电气公司 | 用于去除无机碳的设备和方法及用于检测总有机碳的装置和方法 |
CN104777278A (zh) * | 2015-04-10 | 2015-07-15 | 张振巍 | 一种水总有机碳的测定方法 |
US10458968B2 (en) * | 2015-04-10 | 2019-10-29 | Shimadzu Corporation | Water quality analysis device |
KR102273852B1 (ko) | 2016-03-07 | 2021-07-06 | 와이에스아이 인코포레이티드 | 다변수 수질 측정을 위한 광학 질산염 센서 |
CN109073457B (zh) | 2016-03-09 | 2021-12-28 | Ysi公司 | 用于多参数水质测量的光学硝酸盐传感器补偿算法 |
CN107340274B (zh) * | 2017-03-29 | 2020-01-14 | 宁波方太厨具有限公司 | 有机物检测传感器 |
CN108414645B (zh) * | 2018-04-19 | 2023-05-23 | 南京大学 | 一种体积排阻色谱联用型氮检测器及应用方法 |
Citations (5)
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JP2001281189A (ja) * | 2000-03-30 | 2001-10-10 | Japan Organo Co Ltd | 全有機体炭素の測定方法および装置 |
JP2005106668A (ja) * | 2003-09-30 | 2005-04-21 | Dkk Toa Corp | 全有機炭素含量の測定方法および装置 |
JP2006300633A (ja) * | 2005-04-19 | 2006-11-02 | Shimadzu Corp | 全有機体炭素測定装置 |
WO2006126296A1 (ja) * | 2005-05-26 | 2006-11-30 | Shimadzu Corporation | 全有機体炭素測定方法、全窒素量測定方法及びそれらの測定方法に用いる測定装置 |
JP2006337032A (ja) * | 2005-05-31 | 2006-12-14 | Shimadzu Corp | 配管接続方法及びマイクロチップデバイス |
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2007
- 2007-03-20 JP JP2009505009A patent/JP4983914B2/ja not_active Expired - Fee Related
- 2007-03-20 EP EP07739096.1A patent/EP2136205B1/en not_active Not-in-force
- 2007-03-20 CN CN2007800522137A patent/CN101636652B/zh not_active Expired - Fee Related
- 2007-03-20 US US12/532,146 patent/US20100034702A1/en not_active Abandoned
- 2007-03-20 WO PCT/JP2007/055653 patent/WO2008114410A1/ja active Application Filing
-
2012
- 2012-01-06 US US13/345,032 patent/US8557597B2/en not_active Expired - Fee Related
Patent Citations (5)
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JP2001281189A (ja) * | 2000-03-30 | 2001-10-10 | Japan Organo Co Ltd | 全有機体炭素の測定方法および装置 |
JP2005106668A (ja) * | 2003-09-30 | 2005-04-21 | Dkk Toa Corp | 全有機炭素含量の測定方法および装置 |
JP2006300633A (ja) * | 2005-04-19 | 2006-11-02 | Shimadzu Corp | 全有機体炭素測定装置 |
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Also Published As
Publication number | Publication date |
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JP4983914B2 (ja) | 2012-07-25 |
US8557597B2 (en) | 2013-10-15 |
EP2136205A4 (en) | 2013-10-09 |
EP2136205A1 (en) | 2009-12-23 |
US20100034702A1 (en) | 2010-02-11 |
EP2136205B1 (en) | 2018-02-21 |
CN101636652A (zh) | 2010-01-27 |
US20120107947A1 (en) | 2012-05-03 |
WO2008114410A1 (ja) | 2008-09-25 |
CN101636652B (zh) | 2013-01-09 |
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