JPWO2008102795A1 - フレキシブル多層配線板 - Google Patents
フレキシブル多層配線板 Download PDFInfo
- Publication number
- JPWO2008102795A1 JPWO2008102795A1 JP2009500206A JP2009500206A JPWO2008102795A1 JP WO2008102795 A1 JPWO2008102795 A1 JP WO2008102795A1 JP 2009500206 A JP2009500206 A JP 2009500206A JP 2009500206 A JP2009500206 A JP 2009500206A JP WO2008102795 A1 JPWO2008102795 A1 JP WO2008102795A1
- Authority
- JP
- Japan
- Prior art keywords
- inner layer
- group
- insulating adhesive
- wiring board
- flexible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000000758 substrate Substances 0.000 claims abstract description 57
- 239000000853 adhesive Substances 0.000 claims abstract description 24
- 230000001070 adhesive effect Effects 0.000 claims abstract description 24
- 125000005462 imide group Chemical group 0.000 claims abstract description 18
- 229920000642 polymer Polymers 0.000 claims abstract description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 19
- 239000011889 copper foil Substances 0.000 claims description 19
- 238000005452 bending Methods 0.000 abstract description 17
- 230000035939 shock Effects 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 125
- 239000012790 adhesive layer Substances 0.000 description 46
- 150000004985 diamines Chemical class 0.000 description 24
- 239000004962 Polyamide-imide Substances 0.000 description 18
- 229920002312 polyamide-imide Polymers 0.000 description 18
- 150000001412 amines Chemical class 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 14
- 239000000203 mixture Substances 0.000 description 14
- 125000004432 carbon atom Chemical group C* 0.000 description 11
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 10
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 description 10
- 229910000071 diazene Inorganic materials 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- -1 polyoxypropylene Polymers 0.000 description 6
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- 238000012360 testing method Methods 0.000 description 5
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- 239000004020 conductor Substances 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
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- 239000011347 resin Substances 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- XUSNPFGLKGCWGN-UHFFFAOYSA-N 3-[4-(3-aminopropyl)piperazin-1-yl]propan-1-amine Chemical compound NCCCN1CCN(CCCN)CC1 XUSNPFGLKGCWGN-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
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- 238000009835 boiling Methods 0.000 description 2
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- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
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- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
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- 239000002994 raw material Substances 0.000 description 2
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- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- 125000005628 tolylene group Chemical group 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 2
- SBJCUZQNHOLYMD-UHFFFAOYSA-N 1,5-Naphthalene diisocyanate Chemical compound C1=CC=C2C(N=C=O)=CC=CC2=C1N=C=O SBJCUZQNHOLYMD-UHFFFAOYSA-N 0.000 description 1
- ATOUXIOKEJWULN-UHFFFAOYSA-N 1,6-diisocyanato-2,2,4-trimethylhexane Chemical compound O=C=NCCC(C)CC(C)(C)CN=C=O ATOUXIOKEJWULN-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ISPOMZMFILGSCS-UHFFFAOYSA-N 3-[4-[4-(3-aminocyclohexyl)oxycyclohexyl]sulfonylcyclohexyl]oxycyclohexan-1-amine Chemical compound C1C(N)CCCC1OC1CCC(S(=O)(=O)C2CCC(CC2)OC2CC(N)CCC2)CC1 ISPOMZMFILGSCS-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- IJKKUVYKIIDJSY-UHFFFAOYSA-N 4-(4-amino-2-methylcyclohexyl)-3-methylcyclohexan-1-amine Chemical compound CC1CC(N)CCC1C1C(C)CC(N)CC1 IJKKUVYKIIDJSY-UHFFFAOYSA-N 0.000 description 1
- XBGOIFDPULMOPM-UHFFFAOYSA-N 4-(4-propylcyclohexyl)oxycyclohexan-1-amine Chemical compound NC1CCC(CC1)OC1CCC(CC1)CCC XBGOIFDPULMOPM-UHFFFAOYSA-N 0.000 description 1
- BDBZTOMUANOKRT-UHFFFAOYSA-N 4-[2-(4-aminocyclohexyl)propan-2-yl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1C(C)(C)C1CCC(N)CC1 BDBZTOMUANOKRT-UHFFFAOYSA-N 0.000 description 1
- XZJANRQATNWFFF-UHFFFAOYSA-N 4-[3-(4-aminocyclohexyl)oxyphenoxy]cyclohexan-1-amine Chemical compound C1CC(N)CCC1OC1=CC=CC(OC2CCC(N)CC2)=C1 XZJANRQATNWFFF-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- AILCNTDXHZLKOA-UHFFFAOYSA-N 4-[4-(4-aminocyclohexyl)oxyphenoxy]cyclohexan-1-amine Chemical compound C1CC(N)CCC1OC(C=C1)=CC=C1OC1CCC(N)CC1 AILCNTDXHZLKOA-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- NGYMJNRSTWQKNP-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminocyclohexyl)oxycyclohexyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]cyclohexyl]oxycyclohexan-1-amine Chemical compound C1CC(N)CCC1OC1CCC(C(C2CCC(CC2)OC2CCC(N)CC2)(C(F)(F)F)C(F)(F)F)CC1 NGYMJNRSTWQKNP-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- UVXHGOCKNVBQIT-UHFFFAOYSA-N 4-[4-[4-(4-aminocyclohexyl)oxycyclohexyl]sulfonylcyclohexyl]oxycyclohexan-1-amine Chemical compound C1CC(N)CCC1OC1CCC(S(=O)(=O)C2CCC(CC2)OC2CCC(N)CC2)CC1 UVXHGOCKNVBQIT-UHFFFAOYSA-N 0.000 description 1
- LDFYRFKAYFZVNH-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenoxy]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 LDFYRFKAYFZVNH-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- REPCIIRGRCWJPJ-UHFFFAOYSA-N 4-[4-[[4-(4-aminocyclohexyl)oxycyclohexyl]methyl]cyclohexyl]oxycyclohexan-1-amine Chemical compound C1CC(N)CCC1OC1CCC(CC2CCC(CC2)OC2CCC(N)CC2)CC1 REPCIIRGRCWJPJ-UHFFFAOYSA-N 0.000 description 1
- PJCCVNKHRXIAHZ-UHFFFAOYSA-N 4-[4-[[4-(4-aminophenoxy)phenyl]methyl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1CC(C=C1)=CC=C1OC1=CC=C(N)C=C1 PJCCVNKHRXIAHZ-UHFFFAOYSA-N 0.000 description 1
- 239000009261 D 400 Substances 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
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- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- DHPIOPLFZUEGTQ-UHFFFAOYSA-N NC1(CCC(CC1)C(=O)C1CCC(CC1)(N)N)N Chemical compound NC1(CCC(CC1)C(=O)C1CCC(CC1)(N)N)N DHPIOPLFZUEGTQ-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
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- 125000005263 alkylenediamine group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- RNWMOSZLRHZXRD-UHFFFAOYSA-N bis[4-(4-aminocyclohexyl)oxycyclohexyl]methanone Chemical compound C1CC(N)CCC1OC1CCC(C(=O)C2CCC(CC2)OC2CCC(N)CC2)CC1 RNWMOSZLRHZXRD-UHFFFAOYSA-N 0.000 description 1
- LSDYQEILXDCDTR-UHFFFAOYSA-N bis[4-(4-aminophenoxy)phenyl]methanone Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(=O)C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 LSDYQEILXDCDTR-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
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- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- XXKOQQBKBHUATC-UHFFFAOYSA-N cyclohexylmethylcyclohexane Chemical compound C1CCCCC1CC1CCCCC1 XXKOQQBKBHUATC-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
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- 238000001035 drying Methods 0.000 description 1
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
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- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
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- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
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- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
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- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
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- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
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- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 238000011056 performance test Methods 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
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- 230000036211 photosensitivity Effects 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
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- 238000009751 slip forming Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
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- 229920001187 thermosetting polymer Polymers 0.000 description 1
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- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
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- 125000006839 xylylene group Chemical group 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4697—Manufacturing multilayer circuits having cavities, e.g. for mounting components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0277—Bendability or stretchability details
- H05K1/028—Bending or folding regions of flexible printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
- H05K3/4635—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating flexible circuit boards using additional insulating adhesive materials between the boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
図1は、好適な実施形態のフレキシブル多層配線板の断面構成を模式的に示す図である。図1に示すフレキシブル多層配線板100は、内層基板10、この内層基板10の両側に絶縁接着層20を介して接着された外層配線30、及び、外層配線30の外側をそれぞれ被覆している表面レジスト層40を有している。
次に、上述した好適な実施形態のフレキシブル多層配線板の好適な製造方法について説明する。
[フレキシブル多層配線板の製造]
内層基板としてフレキシブル回路基板を用い、上述した実施形態の方法にしたがって、内層基板に、イミド基含有ポリマーからなる絶縁接着シートを介して電解銅箔からなる外層配線を貼り合わせる工程を行い、図1に示すのと同様の構造を有するフレキシブル多層配線板を得た。この製造方法において用いた材料は次の通りである。
内層基板:両面銅貼りフレキシブル基板
(絶縁層:ポリイミドフィルム(25μm厚、商品名:カプトン100EN、東レ・デュポン(株)製)、内層配線:電解銅箔(12μm厚、商品名:F0−WS、古河サーキットフォイル(株)製))
外層配線:電解銅箔(12μm厚、商品名:F0−WS、古河サーキットフォイル(株)製)
絶縁接着層:イミド基含有接着シート(25μm厚、商品名:KS7003、日立化成工業(株)製)
次に示す各構成材料を用いたこと以外は、実施例1と同様にしてフレキシブル多層配線板を製造した。
内層基板:両面銅貼りフレキシブル基板
(絶縁層:ポリイミドフィルム(25μm厚、商品名:カプトン100EN、東レ・デュポン(株)製)、内層配線:電解銅箔(12μm厚、商品名:F0−WS、古河サーキットフォイル(株)製))
外層配線:電解銅箔(12μm厚、商品名:F0−WS、古河サーキットフォイル(株)製)
絶縁接着層:エポキシ系接着シート(80μm厚、商品名:AS−3000、日立化成工業(株)製)
[特性評価]
各フレキシブル多層配線板について、MIT試験(JIS C6471 8.2に準拠)を行った。なお、この試験における折り曲げ過重は4.9N、折り曲げ角度は135°、折り曲げ半径はR=0.8mm、折り曲げ周期は175回/分とした。そして、折り曲げ部分において段線が生じるまでの折り曲げ回数を測定した。得られた結果を表1に示す。表1中、Aは、折り曲げ回数が1000回以上であったもの、Bは折り曲げ回数が1000回よりも少なかったものをそれぞれ示す。表1には、この評価とともに断線が生じるまでの折り曲げ回数を括弧内に示した。
各フレキシブル多層配線板に対し、気相熱衝撃試験を行った。熱衝撃試験は、60分で40℃〜125℃に温度変化させるのを1サイクルとし、これを1000サイクル繰り返す処理とした。得られた結果を表1に示す。表1中、Aは1000サイクルで断線がなかったもの、Bは1000サイクル未満で断線を生じたものをそれぞれ示している。表1には、この評価とともに断線が生じるまでのサイクル数を括弧内に示した。
Claims (4)
- 絶縁層の両面に内層配線が形成された可とう性を有する内層基板と、
前記内層基板の少なくとも片側に配置された外層配線と、
前記内層基板と前記外層配線との間に介在する絶縁接着シートと、を備え、
前記絶縁接着シートのうちの少なくとも一つは、イミド基含有ポリマーからなる、
ことを特徴とするフレキシブル多層配線板。 - 前記内層配線が、銅箔から構成される、ことを特徴とする請求項1記載のフレキシブル多層配線板。
- 前記外層配線が、銅箔から構成される、ことを特徴とする請求項1又は2記載のフレキシブル多層配線板。
- 前記内層基板を有し前記外層配線を有していないフレキシブル部分と、前記内層基板及び前記外層配線を有するリジッド部分と、を有しており、
前記絶縁接着シートは、前記内層基板の、少なくとも前記外層配線が形成されている側の前記フレキシブル部分及び前記リジッド部分の両方を覆うように形成されており、
前記フレキシブル部分においては、前記内層基板が前記絶縁接着シートのみに覆われている、
ことを特徴とする請求項1〜3のいずれか一項に記載のフレキシブル多層配線板。
Applications Claiming Priority (5)
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JP2007039300 | 2007-02-20 | ||
JP2007039300 | 2007-02-20 | ||
JP2007250028 | 2007-09-26 | ||
JP2007250028 | 2007-09-26 | ||
PCT/JP2008/052830 WO2008102795A1 (ja) | 2007-02-20 | 2008-02-20 | フレキシブル多層配線板 |
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JPWO2008102795A1 true JPWO2008102795A1 (ja) | 2010-05-27 |
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JP2009500206A Pending JPWO2008102795A1 (ja) | 2007-02-20 | 2008-02-20 | フレキシブル多層配線板 |
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US (1) | US8232476B2 (ja) |
JP (1) | JPWO2008102795A1 (ja) |
KR (1) | KR101099400B1 (ja) |
CN (1) | CN101617575B (ja) |
TW (1) | TWI424802B (ja) |
WO (1) | WO2008102795A1 (ja) |
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US8683681B2 (en) * | 2010-12-07 | 2014-04-01 | Raytheon Company | Room temperature low contact pressure method |
KR20150010161A (ko) * | 2013-07-18 | 2015-01-28 | 삼성디스플레이 주식회사 | 가요성 인쇄 회로 필름 및 이를 포함하는 표시 장치 |
CN104582325B (zh) * | 2013-10-12 | 2018-03-27 | 鹏鼎控股(深圳)股份有限公司 | 刚挠结合板及其制作方法、电路板模组 |
CN210405777U (zh) * | 2017-02-20 | 2020-04-24 | 株式会社村田制作所 | 电子设备 |
US10912204B2 (en) * | 2018-03-30 | 2021-02-02 | Samsung Electro-Mechanics Co., Ltd. | Electronic device and rigid-flexible substrate module |
US10638616B1 (en) * | 2018-10-30 | 2020-04-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Circuit carrier and manifacturing method thereof |
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- 2008-02-20 WO PCT/JP2008/052830 patent/WO2008102795A1/ja active Application Filing
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JP2007013113A (ja) * | 2005-05-30 | 2007-01-18 | Hitachi Chem Co Ltd | 多層配線板 |
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US8232476B2 (en) | 2012-07-31 |
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TW200901848A (en) | 2009-01-01 |
US20100084169A1 (en) | 2010-04-08 |
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