JPWO2008072614A1 - 流量比率制御装置 - Google Patents
流量比率制御装置 Download PDFInfo
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- JPWO2008072614A1 JPWO2008072614A1 JP2008549313A JP2008549313A JPWO2008072614A1 JP WO2008072614 A1 JPWO2008072614 A1 JP WO2008072614A1 JP 2008549313 A JP2008549313 A JP 2008549313A JP 2008549313 A JP2008549313 A JP 2008549313A JP WO2008072614 A1 JPWO2008072614 A1 JP WO2008072614A1
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- flow rate
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- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 9
- 239000012530 fluid Substances 0.000 claims description 16
- 230000007246 mechanism Effects 0.000 claims description 11
- 239000002994 raw material Substances 0.000 description 14
- 239000007789 gas Substances 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000004043 responsiveness Effects 0.000 description 5
- 230000001052 transient effect Effects 0.000 description 5
- 230000004044 response Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000009530 blood pressure measurement Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
- G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
- G05D7/0664—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged for the control of a plurality of diverging flows from a single flow
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
- G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
- G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
- G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
- Y10T137/0363—For producing proportionate flow
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7759—Responsive to change in rate of fluid flow
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/7722—Line condition change responsive valves
- Y10T137/7758—Pilot or servo controlled
- Y10T137/7761—Electrically actuated valve
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/8593—Systems
- Y10T137/877—With flow control means for branched passages
- Y10T137/87708—With common valve operator
- Y10T137/87772—With electrical actuation
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Flow Control (AREA)
Abstract
Description
図1は、本実施形態に係る流量比率制御装置100を示す模式的概略図である。この流量比率制御装置100は、例えば、半導体製造用の原料ガスを所定比率に分流して、半導体プロセスチャンバに供給するものであり、図示しない半導体製造システムの一部を構成する。しかしてこのものは、大きくは、流体回路機構200と、その流体回路機構200を制御するための制御機構300とからなる。
f(s)=(100+K1)/(K1+s)・・・(式1)
ここで、f(s)はフィードバックゲイン、sは目標圧力、K1は、適宜設定される調整係数である。なお、f(s)の演算適用箇所であるが、ここでは、目標圧力と実測圧力との偏差にPID演算を施して算出された値に、f(s)を掛けてバルブ制御値を算出するようにしている。その他、制御系によっては、前記偏差にf(s)を掛けてバルブ制御値を算出するようにしてもよいし、偏差にf(s)を掛けて算出された値にPID演算を施してバルブ制御値を算出するようにしても構わない。
Q=Qmfm+Qmfc・・・(式2)
Qmfc_SET
=Q×RATIO_SET
=Qmfm×RATIO_SET/(1−RATIO_SET)・・・(式3)
Claims (3)
- 流体が流れ込むメイン流路と、
そのメイン流路の終端部から分岐する複数の分岐流路と、
各分岐流路上にそれぞれ設けられた制御バルブと、
メイン流路の流量及び各分岐流路の流量を直接的又は間接的に測定する流量測定手段と、
一の分岐流路に設けた制御バルブを制御して、その制御バルブよりも上流側圧力が与えられた目標圧力となるように制御するとともに、その圧力が目標圧力近傍を超えた場合に、各分岐流路の流量比率が予め定めた設定比率となるように、その他の制御バルブの制御を開始するバルブ制御部と、
メイン流路の流量が少ないほど前記目標圧力を低く設定し、その目標圧力を前記バルブ制御部に対して出力する目標圧力設定部と、を備えている流量比率制御装置。 - 前記分岐流路が2本である請求項1記載の流量比率制御装置。
- 流体が流れ込むメイン流路と、そのメイン流路の終端部から分岐する複数の分岐流路と、各分岐流路上にそれぞれ設けられた制御バルブと、メイン流路の流量及び各分岐流路の流量を直接的又は間接的に測定する流量測定手段と、一の分岐流路における制御バルブよりも上流に設けた圧力センサと、を備えた流体回路機構に適用されるものであって、
一の分岐流路に設けた制御バルブを制御して、その制御バルブよりも上流側圧力が与えられた目標圧力となるように制御するとともに、その圧力が目標圧力近傍を超えた場合に、各分岐流路の流量比率が予め定めた設定比率となるように、その他の制御バルブの制御を開始するバルブ制御部と、
メイン流路の流量が少ないほど前記目標圧力を低く設定し、その目標圧力を前記バルブ制御部に対して出力する目標圧力設定部と、を備えている制御機構。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006335119 | 2006-12-12 | ||
JP2006335119 | 2006-12-12 | ||
PCT/JP2007/073834 WO2008072614A1 (ja) | 2006-12-12 | 2007-12-11 | 流量比率制御装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2008072614A1 true JPWO2008072614A1 (ja) | 2010-03-25 |
JP4642115B2 JP4642115B2 (ja) | 2011-03-02 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2008549313A Active JP4642115B2 (ja) | 2006-12-12 | 2007-12-11 | 流量比率制御装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8019481B2 (ja) |
JP (1) | JP4642115B2 (ja) |
KR (1) | KR101428826B1 (ja) |
TW (1) | TWI420568B (ja) |
WO (1) | WO2008072614A1 (ja) |
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CN102681559B (zh) * | 2012-05-23 | 2014-03-19 | 首钢京唐钢铁联合有限责任公司 | 一种基于加压机和阀组的燃气混合控制系统及其控制方法 |
US9004107B2 (en) * | 2012-08-21 | 2015-04-14 | Applied Materials, Inc. | Methods and apparatus for enhanced gas flow rate control |
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JP6193679B2 (ja) * | 2013-08-30 | 2017-09-06 | 株式会社フジキン | ガス分流供給装置及びガス分流供給方法 |
ES2900426T3 (es) * | 2013-12-31 | 2022-03-16 | Rapamycin Holdings Llc | Preparaciones orales y uso de nanopartículas de rapamicina |
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US9904296B2 (en) * | 2014-04-01 | 2018-02-27 | Honeywell International Inc. | Controlling flow in a fluid distribution system |
JP6289997B2 (ja) * | 2014-05-14 | 2018-03-07 | 株式会社堀場エステック | 流量センサの検査方法、検査システム、及び、検査システム用プログラム |
CN105576268B (zh) * | 2014-10-08 | 2019-02-15 | 通用电气公司 | 用于控制流量比的系统和方法 |
DE102015100762A1 (de) * | 2015-01-20 | 2016-07-21 | Infineon Technologies Ag | Behälterschalteinrichtung und Verfahren zum Überwachen einer Fluidrate |
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2007
- 2007-12-11 US US12/518,875 patent/US8019481B2/en active Active
- 2007-12-11 WO PCT/JP2007/073834 patent/WO2008072614A1/ja active Application Filing
- 2007-12-11 KR KR1020097007879A patent/KR101428826B1/ko active IP Right Grant
- 2007-12-11 JP JP2008549313A patent/JP4642115B2/ja active Active
- 2007-12-12 TW TW96147359A patent/TWI420568B/zh active
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Also Published As
Publication number | Publication date |
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WO2008072614A1 (ja) | 2008-06-19 |
JP4642115B2 (ja) | 2011-03-02 |
TWI420568B (zh) | 2013-12-21 |
TW200845113A (en) | 2008-11-16 |
KR101428826B1 (ko) | 2014-08-08 |
US20100030390A1 (en) | 2010-02-04 |
US8019481B2 (en) | 2011-09-13 |
KR20090088861A (ko) | 2009-08-20 |
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