JPWO2007088862A1 - 高開口数露光装置用ペリクル - Google Patents

高開口数露光装置用ペリクル

Info

Publication number
JPWO2007088862A1
JPWO2007088862A1 JP2007556872A JP2007556872A JPWO2007088862A1 JP WO2007088862 A1 JPWO2007088862 A1 JP WO2007088862A1 JP 2007556872 A JP2007556872 A JP 2007556872A JP 2007556872 A JP2007556872 A JP 2007556872A JP WO2007088862 A1 JPWO2007088862 A1 JP WO2007088862A1
Authority
JP
Japan
Prior art keywords
pellicle
film
pellicle film
exposure
numerical aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007556872A
Other languages
English (en)
Japanese (ja)
Inventor
正浩 近藤
正浩 近藤
中野　利彦
利彦 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Publication of JPWO2007088862A1 publication Critical patent/JPWO2007088862A1/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007556872A 2006-02-01 2007-01-30 高開口数露光装置用ペリクル Pending JPWO2007088862A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006024246 2006-02-01
JP2006024246 2006-02-01
PCT/JP2007/051520 WO2007088862A1 (ja) 2006-02-01 2007-01-30 高開口数露光装置用ペリクル

Publications (1)

Publication Number Publication Date
JPWO2007088862A1 true JPWO2007088862A1 (ja) 2009-06-25

Family

ID=38327433

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007556872A Pending JPWO2007088862A1 (ja) 2006-02-01 2007-01-30 高開口数露光装置用ペリクル

Country Status (6)

Country Link
US (1) US20090042107A1 (https=)
EP (1) EP1983370A4 (https=)
JP (1) JPWO2007088862A1 (https=)
KR (1) KR20080098403A (https=)
TW (1) TW200732835A (https=)
WO (1) WO2007088862A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4885241B2 (ja) * 2006-02-17 2012-02-29 フリースケール セミコンダクター インコーポレイテッド ペリクルを用いて層をパターニングする方法
JP4873565B2 (ja) * 2006-04-07 2012-02-08 信越化学工業株式会社 リソグラフィー用ペリクル
JP2007293036A (ja) * 2006-04-25 2007-11-08 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
CN102859397B (zh) * 2010-04-13 2015-11-25 旭化成电子材料株式会社 自支撑膜、自支撑结构体、自支撑膜的制造方法及表膜
KR20120081667A (ko) * 2011-01-04 2012-07-20 주식회사 에프에스티 펠리클 막 및 그 제조방법
TWI611479B (zh) * 2016-09-29 2018-01-11 台灣積體電路製造股份有限公司 薄膜組件的製造方法

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000162761A (ja) * 1998-09-22 2000-06-16 Mitsui Chemicals Inc ペリクル、その製法及び露光方法
JP2001066760A (ja) * 1999-08-30 2001-03-16 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2001109133A (ja) * 1999-10-06 2001-04-20 Mitsui Chemicals Inc ペリクル膜及びそれを利用する露光方法
JP2001154340A (ja) * 1999-11-25 2001-06-08 Asahi Glass Co Ltd ペリクル
JP2001264957A (ja) * 2000-03-22 2001-09-28 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2004085639A (ja) * 2002-08-23 2004-03-18 Asahi Glass Co Ltd ペリクル及びこれを用いる露光処理方法
JP2004085713A (ja) * 2002-08-23 2004-03-18 Asahi Glass Co Ltd ペリクル
JP2004102269A (ja) * 2002-08-21 2004-04-02 Asahi Glass Co Ltd 紫外光透過性含フッ素重合体および該重合体からなるペリクル
JP2004226476A (ja) * 2003-01-20 2004-08-12 Asahi Glass Co Ltd ペリクルの製造方法
JP2004527799A (ja) * 2001-05-30 2004-09-09 マイクロ リソグラフィー， インコーポレイテッド 帯電防止光学ペリクル
JP2005070120A (ja) * 2003-08-27 2005-03-17 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07199451A (ja) * 1993-12-28 1995-08-04 Shin Etsu Chem Co Ltd ペリクル
US5741576A (en) * 1995-09-06 1998-04-21 Inko Industrial Corporation Optical pellicle with controlled transmission peaks and anti-reflective coatings
TW420770B (en) * 1998-09-22 2001-02-01 Mitsui Chemicals Inc Pellicle film, method of preparing the same and exposure method
JP2000275817A (ja) * 1999-01-22 2000-10-06 Shin Etsu Chem Co Ltd リソグラフィー用ペリクルおよびその製造方法
JP4000231B2 (ja) * 1999-03-10 2007-10-31 信越化学工業株式会社 耐光性を改良したリソグラフィー用ペリクル
JP3562790B2 (ja) * 1999-06-02 2004-09-08 信越化学工業株式会社 ペリクル
US6824930B1 (en) * 1999-11-17 2004-11-30 E. I. Du Pont De Nemours And Company Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses
US7271950B1 (en) * 2000-02-16 2007-09-18 Toppan Photomasks, Inc. Apparatus and method for optimizing a pellicle for off-axis transmission of light
JP2008502154A (ja) * 2004-06-01 2008-01-24 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 紫外線透過性アルカンと、これを真空用途および深紫外線用途に利用する方法
WO2007009543A1 (en) * 2005-07-18 2007-01-25 Carl Zeiss Smt Ag Pellicle for use in a microlithographic exposure apparatus

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000162761A (ja) * 1998-09-22 2000-06-16 Mitsui Chemicals Inc ペリクル、その製法及び露光方法
JP2001066760A (ja) * 1999-08-30 2001-03-16 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2001109133A (ja) * 1999-10-06 2001-04-20 Mitsui Chemicals Inc ペリクル膜及びそれを利用する露光方法
JP2001154340A (ja) * 1999-11-25 2001-06-08 Asahi Glass Co Ltd ペリクル
JP2001264957A (ja) * 2000-03-22 2001-09-28 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JP2004527799A (ja) * 2001-05-30 2004-09-09 マイクロ リソグラフィー， インコーポレイテッド 帯電防止光学ペリクル
JP2004102269A (ja) * 2002-08-21 2004-04-02 Asahi Glass Co Ltd 紫外光透過性含フッ素重合体および該重合体からなるペリクル
JP2004085639A (ja) * 2002-08-23 2004-03-18 Asahi Glass Co Ltd ペリクル及びこれを用いる露光処理方法
JP2004085713A (ja) * 2002-08-23 2004-03-18 Asahi Glass Co Ltd ペリクル
JP2004226476A (ja) * 2003-01-20 2004-08-12 Asahi Glass Co Ltd ペリクルの製造方法
JP2005070120A (ja) * 2003-08-27 2005-03-17 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル

Also Published As

Publication number Publication date
TW200732835A (en) 2007-09-01
WO2007088862A1 (ja) 2007-08-09
EP1983370A1 (en) 2008-10-22
US20090042107A1 (en) 2009-02-12
TWI329781B (https=) 2010-09-01
EP1983370A4 (en) 2010-08-18
KR20080098403A (ko) 2008-11-07

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