JPWO2007058010A1 - 半導体圧力センサおよびその製造方法 - Google Patents
半導体圧力センサおよびその製造方法 Download PDFInfo
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- JPWO2007058010A1 JPWO2007058010A1 JP2007545167A JP2007545167A JPWO2007058010A1 JP WO2007058010 A1 JPWO2007058010 A1 JP WO2007058010A1 JP 2007545167 A JP2007545167 A JP 2007545167A JP 2007545167 A JP2007545167 A JP 2007545167A JP WO2007058010 A1 JPWO2007058010 A1 JP WO2007058010A1
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- pressure sensor
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 108
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 60
- 230000002093 peripheral effect Effects 0.000 claims abstract description 15
- 230000007423 decrease Effects 0.000 claims abstract description 8
- 238000001312 dry etching Methods 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 56
- 229910052710 silicon Inorganic materials 0.000 abstract description 56
- 239000010703 silicon Substances 0.000 abstract description 56
- 230000008859 change Effects 0.000 abstract description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 60
- 229910052814 silicon oxide Inorganic materials 0.000 description 60
- 238000005259 measurement Methods 0.000 description 27
- 238000005530 etching Methods 0.000 description 14
- 229910052581 Si3N4 Inorganic materials 0.000 description 12
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 238000001039 wet etching Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000009530 blood pressure measurement Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000011158 quantitative evaluation Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/84—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
- G01L9/0047—Diaphragm with non uniform thickness, e.g. with grooves, bosses or continuously varying thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/04—Means for compensating for effects of changes of temperature, i.e. other than electric compensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
- G01L9/0048—Details about the mounting of the diaphragm to its support or about the diaphragm edges, e.g. notches, round shapes for stress relief
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
- G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
- G01L9/0054—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements integral with a semiconducting diaphragm
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Abstract
Description
まず、図3に示すように、シリコン薄板3/シリコン酸化膜2/シリコン支持基板1からなるSOI基板が準備される。次に、図4に示すように、SOI基板のシリコン薄板3に歪ゲージ4が形成される。歪ゲージ4は、シリコン薄板3の主表面から所定の深さにかけて拡散された不純物領域からなる。歪ゲージ4を構成する不純物としては、たとえば、ボロンが用いられる。また、この不純物は、熱拡散法およびイオン注入法によって、シリコン薄板3内に形成される。
Claims (7)
- 厚さ方向に延びる貫通孔(1a)が形成された半導体支持基板(1)と、
前記半導体支持基板(1)の上方に位置付けられた半導体薄板(3)と、
前記半導体支持基板(1)と前記半導体薄板(3)とによって挟まれ、前記貫通孔(1a)に面する位置に凹部(2a)を有し、該凹部(2a)の位置における厚さが周縁部から中央部に向かって小さくなっている絶縁層(3)とを備えた、半導体圧力センサ。 - 前記絶縁層(2)の厚さの最大値がTmaxであり、かつ、前記絶縁層(2)の厚さの最小値がTminである場合に、前記絶縁層(2)の厚さがTmaxである領域の端部から前記絶縁層(2)の厚さが(Tmax+Tmin)÷2になる位置までの距離をAとすると、A÷Tmaxが5以上である、請求の範囲1に記載の半導体圧力センサ。
- 前記絶縁層(2)の厚さの最大値Tmaxが2μm以下である、請求の範囲2に記載の半導体圧力センサ。
- 前記凹部(2a)の周縁部は、前記貫通孔(1a)の周縁部よりも外側に位置付けられている、請求の範囲1に記載の半導体圧力センサ。
- 半導体支持基板(1)と、前記半導体支持基板(1)上に設けられた絶縁層(2)と、前記絶縁層(2)上に形成された半導体薄板(3)とを備えた中間構造体を準備するステップと、
前記半導体支持基板(1)にその厚さ方向に延びる貫通孔(1a)を形成するステップと、
前記貫通孔(1a)に面する位置における前記絶縁層(2)の厚さが周縁部から中央部に向かって小さくなるように、前記絶縁層(2)に凹部(2a)を形成するステップとを備えた、半導体圧力センサの製造方法。 - 前記凹部(2a)は、前記絶縁層(2)のドライエッチングによって形成される、請求の範囲5に記載の半導体圧力センサの製造方法。
- 前記絶縁層(2)に前記凹部(2a)を形成するステップにおいては、前記凹部(2a)の周縁部が前記貫通孔(1a)の周縁部よりも外側に位置付けられる、請求の範囲5に記載の半導体圧力センサの製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007545167A JP4916449B2 (ja) | 2005-11-15 | 2006-08-30 | 半導体圧力センサおよびその製造方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005330182 | 2005-11-15 | ||
JP2005330182 | 2005-11-15 | ||
PCT/JP2006/317053 WO2007058010A1 (ja) | 2005-11-15 | 2006-08-30 | 半導体圧力センサおよびその製造方法 |
JP2007545167A JP4916449B2 (ja) | 2005-11-15 | 2006-08-30 | 半導体圧力センサおよびその製造方法 |
Publications (2)
Publication Number | Publication Date |
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JPWO2007058010A1 true JPWO2007058010A1 (ja) | 2009-04-30 |
JP4916449B2 JP4916449B2 (ja) | 2012-04-11 |
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JP2007545167A Active JP4916449B2 (ja) | 2005-11-15 | 2006-08-30 | 半導体圧力センサおよびその製造方法 |
Country Status (6)
Country | Link |
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US (1) | US7786541B2 (ja) |
JP (1) | JP4916449B2 (ja) |
KR (1) | KR101007432B1 (ja) |
CN (1) | CN101273255B (ja) |
DE (1) | DE112006002946T5 (ja) |
WO (1) | WO2007058010A1 (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009069030A (ja) * | 2007-09-14 | 2009-04-02 | Mitsubishi Electric Corp | 圧力検出素子 |
WO2009041463A1 (ja) * | 2007-09-25 | 2009-04-02 | Alps Electric Co., Ltd. | 半導体圧力センサ |
JP5067584B2 (ja) * | 2009-03-02 | 2012-11-07 | オムロン株式会社 | 半導体センサ及びその製造方法 |
JP5092167B2 (ja) * | 2009-03-24 | 2012-12-05 | 三菱電機株式会社 | 半導体圧力センサおよびその製造方法 |
JP5286153B2 (ja) * | 2009-04-28 | 2013-09-11 | アズビル株式会社 | 圧力センサの製造方法 |
US20130015537A1 (en) * | 2009-12-23 | 2013-01-17 | Epcos Ag | Piezoresistive pressure sensor and process for producing a piezoresistive pressure sensor |
WO2011083160A2 (de) * | 2010-01-11 | 2011-07-14 | Elmos Semiconductor Ag | Mikroelektromechanisches halbleiterbauelement und verfahren zu seiner herstellung |
JP5558198B2 (ja) * | 2010-05-13 | 2014-07-23 | 三菱電機株式会社 | 半導体圧力センサ |
JP2012189460A (ja) * | 2011-03-10 | 2012-10-04 | Omron Corp | 絶対圧力センサ |
JP5639985B2 (ja) * | 2011-10-28 | 2014-12-10 | 三菱電機株式会社 | 半導体圧力センサおよび半導体圧力センサの製造方法 |
CN103822735A (zh) * | 2012-11-16 | 2014-05-28 | 无锡华润上华半导体有限公司 | 一种压力传感器用晶片结构及该晶片结构的加工方法 |
DE102013114615A1 (de) * | 2013-12-20 | 2015-06-25 | Endress + Hauser Gmbh + Co. Kg | Drucksensor und Verfahren zur Herstellung eines Drucksensors |
CN103693614B (zh) * | 2013-12-30 | 2015-12-30 | 中国电子科技集团公司第四十九研究所 | 圆弧应力匀散结构抗过载微压传感器的制造方法 |
US10322481B2 (en) * | 2014-03-06 | 2019-06-18 | Infineon Technologies Ag | Support structure and method of forming a support structure |
CN103983395B (zh) * | 2014-05-30 | 2016-04-27 | 西安交通大学 | 一种微压力传感器及其制备与检测方法 |
JP6212000B2 (ja) * | 2014-07-02 | 2017-10-11 | 株式会社東芝 | 圧力センサ、並びに圧力センサを用いたマイクロフォン、血圧センサ、及びタッチパネル |
KR101983877B1 (ko) * | 2015-12-28 | 2019-05-29 | 전자부품연구원 | 반도체 압력센서 및 그의 제조방법 |
DE102020101457A1 (de) | 2020-01-22 | 2021-07-22 | Endress+Hauser SE+Co. KG | Drucksensor |
US11776887B2 (en) * | 2021-05-07 | 2023-10-03 | Advanced Semiconductor Engineering, Inc. | Semiconductor package structure and method for manufacturing the same |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS62163740U (ja) * | 1986-04-09 | 1987-10-17 | ||
JPH04328434A (ja) * | 1991-04-30 | 1992-11-17 | Hitachi Ltd | 複合センサ |
JPH06224450A (ja) * | 1993-01-28 | 1994-08-12 | Canon Inc | 半導体装置の製造方法 |
JPH10335305A (ja) * | 1996-09-02 | 1998-12-18 | Denso Corp | 半導体装置の製造方法 |
JP2000028457A (ja) * | 1998-05-30 | 2000-01-28 | Robert Bosch Gmbh | センサ膜基板の製造方法 |
JP2001358345A (ja) * | 2000-06-13 | 2001-12-26 | Denso Corp | 半導体圧力センサの製造方法 |
JP2002208708A (ja) * | 2001-01-11 | 2002-07-26 | Denso Corp | 半導体圧力センサおよびその製造方法 |
Family Cites Families (4)
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JPS62163740A (ja) | 1986-01-14 | 1987-07-20 | Kawasaki Heavy Ind Ltd | 粒形調整機 |
JP2803321B2 (ja) | 1990-04-27 | 1998-09-24 | 株式会社デンソー | 半導体感歪センサ |
JP3506932B2 (ja) * | 1998-12-09 | 2004-03-15 | 株式会社山武 | 半導体圧力センサ及びその製造方法 |
JP2002350259A (ja) | 2001-05-28 | 2002-12-04 | Matsushita Electric Works Ltd | 半導体圧力センサおよびその製造方法 |
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2006
- 2006-08-30 DE DE112006002946T patent/DE112006002946T5/de active Pending
- 2006-08-30 US US12/067,426 patent/US7786541B2/en active Active
- 2006-08-30 JP JP2007545167A patent/JP4916449B2/ja active Active
- 2006-08-30 KR KR1020087011818A patent/KR101007432B1/ko active IP Right Grant
- 2006-08-30 WO PCT/JP2006/317053 patent/WO2007058010A1/ja active Application Filing
- 2006-08-30 CN CN2006800353581A patent/CN101273255B/zh active Active
Patent Citations (7)
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JPS62163740U (ja) * | 1986-04-09 | 1987-10-17 | ||
JPH04328434A (ja) * | 1991-04-30 | 1992-11-17 | Hitachi Ltd | 複合センサ |
JPH06224450A (ja) * | 1993-01-28 | 1994-08-12 | Canon Inc | 半導体装置の製造方法 |
JPH10335305A (ja) * | 1996-09-02 | 1998-12-18 | Denso Corp | 半導体装置の製造方法 |
JP2000028457A (ja) * | 1998-05-30 | 2000-01-28 | Robert Bosch Gmbh | センサ膜基板の製造方法 |
JP2001358345A (ja) * | 2000-06-13 | 2001-12-26 | Denso Corp | 半導体圧力センサの製造方法 |
JP2002208708A (ja) * | 2001-01-11 | 2002-07-26 | Denso Corp | 半導体圧力センサおよびその製造方法 |
Also Published As
Publication number | Publication date |
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CN101273255A (zh) | 2008-09-24 |
WO2007058010A1 (ja) | 2007-05-24 |
US7786541B2 (en) | 2010-08-31 |
DE112006002946T5 (de) | 2009-01-02 |
CN101273255B (zh) | 2010-05-19 |
KR20080068079A (ko) | 2008-07-22 |
US20090140355A1 (en) | 2009-06-04 |
JP4916449B2 (ja) | 2012-04-11 |
KR101007432B1 (ko) | 2011-01-12 |
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