JPWO2006087937A1 - ダイヤモンド半導体整流素子 - Google Patents
ダイヤモンド半導体整流素子 Download PDFInfo
- Publication number
- JPWO2006087937A1 JPWO2006087937A1 JP2007503618A JP2007503618A JPWO2006087937A1 JP WO2006087937 A1 JPWO2006087937 A1 JP WO2006087937A1 JP 2007503618 A JP2007503618 A JP 2007503618A JP 2007503618 A JP2007503618 A JP 2007503618A JP WO2006087937 A1 JPWO2006087937 A1 JP WO2006087937A1
- Authority
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- Prior art keywords
- diamond
- rectifying
- electrode
- diamond semiconductor
- rectifier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010432 diamond Substances 0.000 title claims abstract description 74
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 73
- 239000004065 semiconductor Substances 0.000 title claims abstract description 46
- 239000010409 thin film Substances 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 150000001875 compounds Chemical class 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 11
- 239000003870 refractory metal Substances 0.000 claims abstract description 9
- 230000003647 oxidation Effects 0.000 claims abstract description 6
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 15
- 239000010936 titanium Substances 0.000 description 14
- 239000013078 crystal Substances 0.000 description 11
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 238000001947 vapour-phase growth Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000005984 hydrogenation reaction Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910021642 ultra pure water Inorganic materials 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Natural products CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WXRGABKACDFXMG-UHFFFAOYSA-N trimethylborane Chemical compound CB(C)C WXRGABKACDFXMG-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic System
- H01L29/1602—Diamond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/0405—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising semiconducting carbon, e.g. diamond, diamond-like carbon
- H01L21/0425—Making electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/47—Schottky barrier electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/872—Schottky diodes
Abstract
Description
本発明の実施例においてもこの方法を用いるが、成長表面には水素化された表面伝導層が存在するため、沸騰させた硫酸・塩酸混合溶液処理によって酸化処理を行い、表面伝導層を除去したダイヤモンド表面を整流性電極の接触界面として使用する。
2:ダイヤモンド単結晶膜
3:Ti/WCオーム性電極
4:WC整流性電極
Claims (2)
- 整流性電極を有するダイヤモンド半導体整流素子であって、ダイヤモンド半導体上の酸化処理表面に、高融点金属元素のカーバイド化合物であるTiC、ZrC、HfC、VC、NbC、TaC、CrC、MoC、およびWCの内少なくとも1つのカーバイド化合物が薄膜として層状構造を持つ整流性電極を有することを特徴とするダイヤモンド半導体整流素子。
- 熱処理によってダイヤモンドと冶金学的に反応する金属元素からなる第1層電極と高融点金属元素のカーバイド化合物からなる第2層電極からなるオーム性電極が熱処理されてダイヤモンド半導体上の酸化処理表面に形成されていることを特徴とする請求項1記載のダイヤモンド半導体整流素子。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007503618A JP5158777B2 (ja) | 2005-02-16 | 2006-02-07 | ダイヤモンド半導体整流素子 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005038517 | 2005-02-16 | ||
JP2005038517 | 2005-02-16 | ||
PCT/JP2006/302048 WO2006087937A1 (ja) | 2005-02-16 | 2006-02-07 | ダイヤモンド半導体整流素子 |
JP2007503618A JP5158777B2 (ja) | 2005-02-16 | 2006-02-07 | ダイヤモンド半導体整流素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2006087937A1 true JPWO2006087937A1 (ja) | 2008-07-03 |
JP5158777B2 JP5158777B2 (ja) | 2013-03-06 |
Family
ID=36916345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007503618A Expired - Fee Related JP5158777B2 (ja) | 2005-02-16 | 2006-02-07 | ダイヤモンド半導体整流素子 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5158777B2 (ja) |
WO (1) | WO2006087937A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009200110A (ja) * | 2008-02-19 | 2009-09-03 | Sumitomo Electric Ind Ltd | ダイヤモンド電子素子及びダイヤモンド電子素子の製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2671259B2 (ja) * | 1988-03-28 | 1997-10-29 | 住友電気工業株式会社 | ショットキー接合半導体装置 |
JPH05891A (ja) * | 1991-06-21 | 1993-01-08 | Canon Inc | ダイヤモンド−金属接合体 |
JP3086556B2 (ja) * | 1993-02-09 | 2000-09-11 | 株式会社神戸製鋼所 | 半導体ダイヤモンド層上の耐熱性オーミック電極及びその形成方法 |
JP3086562B2 (ja) * | 1993-03-22 | 2000-09-11 | 株式会社神戸製鋼所 | 半導体ダイヤモンド層上の耐熱性オーミック電極及びその形成方法 |
JP3304541B2 (ja) * | 1993-09-08 | 2002-07-22 | 住友電気工業株式会社 | オーミック電極の形成方法 |
JPH08148445A (ja) * | 1994-11-24 | 1996-06-07 | Kobe Steel Ltd | ダイヤモンド上の金属炭化物電極形成方法 |
JP2000277798A (ja) * | 1999-03-26 | 2000-10-06 | Kobe Steel Ltd | ダイヤモンド電子素子 |
JP4241174B2 (ja) * | 2003-05-07 | 2009-03-18 | 住友電気工業株式会社 | 低抵抗n型半導体ダイヤモンド |
JP4123496B2 (ja) * | 2004-11-25 | 2008-07-23 | 独立行政法人物質・材料研究機構 | ダイヤモンド紫外光センサー |
-
2006
- 2006-02-07 WO PCT/JP2006/302048 patent/WO2006087937A1/ja not_active Application Discontinuation
- 2006-02-07 JP JP2007503618A patent/JP5158777B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2006087937A1 (ja) | 2006-08-24 |
JP5158777B2 (ja) | 2013-03-06 |
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