JPS649623B2 - - Google Patents
Info
- Publication number
- JPS649623B2 JPS649623B2 JP53029030A JP2903078A JPS649623B2 JP S649623 B2 JPS649623 B2 JP S649623B2 JP 53029030 A JP53029030 A JP 53029030A JP 2903078 A JP2903078 A JP 2903078A JP S649623 B2 JPS649623 B2 JP S649623B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- image forming
- forming member
- gas
- photoconductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010410 layer Substances 0.000 claims description 376
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 143
- 239000012535 impurity Substances 0.000 claims description 45
- 239000002345 surface coating layer Substances 0.000 claims description 19
- 238000003384 imaging method Methods 0.000 claims description 14
- 230000000737 periodic effect Effects 0.000 claims description 8
- 229910052785 arsenic Inorganic materials 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 230000004888 barrier function Effects 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 3
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 229910052716 thallium Inorganic materials 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 104
- 239000000758 substrate Substances 0.000 description 72
- 208000028659 discharge Diseases 0.000 description 59
- 238000000034 method Methods 0.000 description 49
- 239000000463 material Substances 0.000 description 38
- 238000004519 manufacturing process Methods 0.000 description 29
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 23
- 229910000077 silane Inorganic materials 0.000 description 22
- 238000007740 vapor deposition Methods 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 20
- 238000000151 deposition Methods 0.000 description 18
- 238000004544 sputter deposition Methods 0.000 description 18
- 230000008021 deposition Effects 0.000 description 17
- 239000010408 film Substances 0.000 description 17
- 239000002994 raw material Substances 0.000 description 16
- 230000008569 process Effects 0.000 description 14
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 12
- -1 Al 2 O 3 Chemical class 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 230000002441 reversible effect Effects 0.000 description 10
- 230000035945 sensitivity Effects 0.000 description 10
- 239000011230 binding agent Substances 0.000 description 9
- 238000011161 development Methods 0.000 description 9
- 230000005684 electric field Effects 0.000 description 9
- 230000006870 function Effects 0.000 description 9
- 108091008695 photoreceptors Proteins 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- 239000000969 carrier Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 6
- 206010034972 Photosensitivity reaction Diseases 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000036211 photosensitivity Effects 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- FKNIDKXOANSRCS-UHFFFAOYSA-N 2,3,4-trinitrofluoren-1-one Chemical compound C1=CC=C2C3=C([N+](=O)[O-])C([N+]([O-])=O)=C([N+]([O-])=O)C(=O)C3=CC2=C1 FKNIDKXOANSRCS-UHFFFAOYSA-N 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229920003002 synthetic resin Polymers 0.000 description 4
- 239000000057 synthetic resin Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052714 tellurium Inorganic materials 0.000 description 3
- 230000005641 tunneling Effects 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 150000004678 hydrides Chemical class 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 239000005033 polyvinylidene chloride Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000010408 sweeping Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 229910000878 H alloy Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 206010047571 Visual impairment Diseases 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229940075397 calomel Drugs 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011981 development test Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052990 silicon hydride Inorganic materials 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
- Photoreceptors In Electrophotography (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (12)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2903078A JPS54121743A (en) | 1978-03-14 | 1978-03-14 | Electrophotographic image forming member |
| DE2954552A DE2954552C2 (US20080293856A1-20081127-C00150.png) | 1978-03-03 | 1979-03-02 | |
| GB7907505A GB2018446B (en) | 1978-03-03 | 1979-03-02 | Image-forming member for electrophotography |
| DE19792908123 DE2908123A1 (de) | 1978-03-03 | 1979-03-02 | Bildaufzeichnungsmaterial fuer elektrophotographie |
| DE2954551A DE2954551C2 (US20080293856A1-20081127-C00150.png) | 1978-03-03 | 1979-03-02 | |
| US06/269,846 US4461819A (en) | 1978-03-03 | 1981-06-03 | Image-forming member for electrophotography |
| US06/565,191 US4557990A (en) | 1978-03-03 | 1983-12-23 | Hydrogenated amorphous silicon photosensitive member for electrophotography |
| US06/565,146 US4551405A (en) | 1978-03-03 | 1983-12-23 | Image forming process employing member with a depletion layer |
| US06/763,214 US4613558A (en) | 1978-03-03 | 1985-08-07 | Hydrogenated amorphous silicon photosensitive method for electrophotography |
| US06/872,935 US4670369A (en) | 1978-03-03 | 1986-06-11 | Image-forming member for electrophotography |
| HK426/88A HK42688A (en) | 1978-03-03 | 1988-06-09 | Image-forming member for electrophotography |
| US08/121,252 USRE35198E (en) | 1978-03-03 | 1993-09-15 | Image forming member for electrophotography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2903078A JPS54121743A (en) | 1978-03-14 | 1978-03-14 | Electrophotographic image forming member |
Related Child Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9804282A Division JPS5875158A (ja) | 1982-06-08 | 1982-06-08 | 電子写真法 |
| JP57098043A Division JPS5875155A (ja) | 1982-06-08 | 1982-06-08 | 電子写真用像形成部材 |
| JP57143102A Division JPS5875157A (ja) | 1982-08-17 | 1982-08-17 | 電子写真用像形成部材 |
| JP57143101A Division JPS5875156A (ja) | 1982-08-17 | 1982-08-17 | 電子写真法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54121743A JPS54121743A (en) | 1979-09-21 |
| JPS649623B2 true JPS649623B2 (US20080293856A1-20081127-C00150.png) | 1989-02-17 |
Family
ID=12265004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2903078A Granted JPS54121743A (en) | 1978-03-03 | 1978-03-14 | Electrophotographic image forming member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54121743A (US20080293856A1-20081127-C00150.png) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS564150A (en) * | 1979-06-22 | 1981-01-17 | Minolta Camera Co Ltd | Electrophotographic receptor |
| JPS5662255A (en) * | 1979-10-26 | 1981-05-28 | Fuji Photo Film Co Ltd | Electrophotographic receptor |
| JPS5664347A (en) * | 1979-10-30 | 1981-06-01 | Fuji Photo Film Co Ltd | Electrophotographic receptor |
| JPS5664346A (en) * | 1979-10-30 | 1981-06-01 | Fuji Photo Film Co Ltd | Electrophotographic receptor and its preparation |
| JPS56115573A (en) * | 1980-02-15 | 1981-09-10 | Matsushita Electric Ind Co Ltd | Photoconductive element |
| JPS56161551A (en) * | 1980-05-16 | 1981-12-11 | Canon Inc | Image forming member for electrophotography |
| JPS57207169A (en) * | 1981-06-15 | 1982-12-18 | Fuji Electric Corp Res & Dev Ltd | Production of photoreceptor for electrophotography |
| US4675263A (en) | 1984-03-12 | 1987-06-23 | Canon Kabushiki Kaisha | Member having substrate and light-receiving layer of A-Si:Ge film and A-Si film with non-parallel interface with substrate |
| JPS59210446A (ja) * | 1984-04-11 | 1984-11-29 | Hitachi Ltd | 電子写真感光膜 |
| US4678733A (en) | 1984-10-15 | 1987-07-07 | Canon Kabushiki Kaisha | Member having light receiving layer of A-Si: Ge (C,N,O) A-Si/surface antireflection layer with non-parallel interfaces |
| JPS6290663A (ja) | 1985-10-17 | 1987-04-25 | Canon Inc | 光受容部材 |
| US6365308B1 (en) | 1992-12-21 | 2002-04-02 | Canon Kabushiki Kaisha | Light receiving member for electrophotography |
| JP2617417B2 (ja) * | 1993-10-25 | 1997-06-04 | 株式会社 半導体エネルギー研究所 | 電子写真用感光体 |
-
1978
- 1978-03-14 JP JP2903078A patent/JPS54121743A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54121743A (en) | 1979-09-21 |
