JPS649606B2 - - Google Patents

Info

Publication number
JPS649606B2
JPS649606B2 JP52120419A JP12041977A JPS649606B2 JP S649606 B2 JPS649606 B2 JP S649606B2 JP 52120419 A JP52120419 A JP 52120419A JP 12041977 A JP12041977 A JP 12041977A JP S649606 B2 JPS649606 B2 JP S649606B2
Authority
JP
Japan
Prior art keywords
light
mask
optical system
objective lens
beam splitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52120419A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5454056A (en
Inventor
Akyoshi Suzuki
Ichiro Kano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP12041977A priority Critical patent/JPS5454056A/ja
Priority to DE19782843282 priority patent/DE2843282A1/de
Priority to US05/948,776 priority patent/US4251129A/en
Publication of JPS5454056A publication Critical patent/JPS5454056A/ja
Publication of JPS649606B2 publication Critical patent/JPS649606B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP12041977A 1977-10-05 1977-10-06 Photoelectric detector Granted JPS5454056A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP12041977A JPS5454056A (en) 1977-10-06 1977-10-06 Photoelectric detector
DE19782843282 DE2843282A1 (de) 1977-10-05 1978-10-04 Fotoelektrische erfassungsvorrichtung
US05/948,776 US4251129A (en) 1977-10-05 1978-10-05 Photoelectric detecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12041977A JPS5454056A (en) 1977-10-06 1977-10-06 Photoelectric detector

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP62006341A Division JPS62188902A (ja) 1987-01-14 1987-01-14 光学装置

Publications (2)

Publication Number Publication Date
JPS5454056A JPS5454056A (en) 1979-04-27
JPS649606B2 true JPS649606B2 (en, 2012) 1989-02-17

Family

ID=14785749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12041977A Granted JPS5454056A (en) 1977-10-05 1977-10-06 Photoelectric detector

Country Status (1)

Country Link
JP (1) JPS5454056A (en, 2012)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59101677A (ja) * 1982-12-01 1984-06-12 Ricoh Co Ltd 磁気ブラシ現像装置
JPH0732109B2 (ja) * 1983-10-07 1995-04-10 株式会社日立製作所 光露光方法
JPS60227218A (ja) * 1984-04-25 1985-11-12 Fuji Photo Film Co Ltd 光ビ−ム分割合成方法
JPS637618A (ja) * 1986-06-27 1988-01-13 Nippon Tairan Kk 半導体製造装置におけるレ−ザビ−ム位置決め装置
JP2591582B2 (ja) * 1993-06-25 1997-03-19 株式会社ニコン 投影型露光装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5442914Y2 (en, 2012) * 1974-08-27 1979-12-12

Also Published As

Publication number Publication date
JPS5454056A (en) 1979-04-27

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