JPH0121614B2 - - Google Patents

Info

Publication number
JPH0121614B2
JPH0121614B2 JP57184000A JP18400082A JPH0121614B2 JP H0121614 B2 JPH0121614 B2 JP H0121614B2 JP 57184000 A JP57184000 A JP 57184000A JP 18400082 A JP18400082 A JP 18400082A JP H0121614 B2 JPH0121614 B2 JP H0121614B2
Authority
JP
Japan
Prior art keywords
wafer
light
beam splitter
alignment
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57184000A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5972728A (ja
Inventor
Akyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP57184000A priority Critical patent/JPS5972728A/ja
Priority to DE19833337874 priority patent/DE3337874A1/de
Priority to GB08327927A priority patent/GB2130738B/en
Publication of JPS5972728A publication Critical patent/JPS5972728A/ja
Publication of JPH0121614B2 publication Critical patent/JPH0121614B2/ja
Priority to US07/355,871 priority patent/US5048968A/en
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP57184000A 1982-10-20 1982-10-20 自動整合装置 Granted JPS5972728A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57184000A JPS5972728A (ja) 1982-10-20 1982-10-20 自動整合装置
DE19833337874 DE3337874A1 (de) 1982-10-20 1983-10-18 Optisches system zur erfassung von ausrichtungsmarken
GB08327927A GB2130738B (en) 1982-10-20 1983-10-19 An alignment mark detecting optical system
US07/355,871 US5048968A (en) 1982-10-20 1989-05-23 Alignment mark detecting optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57184000A JPS5972728A (ja) 1982-10-20 1982-10-20 自動整合装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP62014381A Division JPS62181431A (ja) 1987-01-23 1987-01-23 自動整合装置
JP62014382A Division JPS62181432A (ja) 1987-01-23 1987-01-23 自動整合装置

Publications (2)

Publication Number Publication Date
JPS5972728A JPS5972728A (ja) 1984-04-24
JPH0121614B2 true JPH0121614B2 (en, 2012) 1989-04-21

Family

ID=16145562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57184000A Granted JPS5972728A (ja) 1982-10-20 1982-10-20 自動整合装置

Country Status (4)

Country Link
US (1) US5048968A (en, 2012)
JP (1) JPS5972728A (en, 2012)
DE (1) DE3337874A1 (en, 2012)
GB (1) GB2130738B (en, 2012)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6052021A (ja) * 1983-08-31 1985-03-23 Canon Inc 位置検出方法
JPS6327016A (ja) * 1986-07-18 1988-02-04 Matsushita Electric Ind Co Ltd 露光装置
JPH0746680B2 (ja) * 1986-09-24 1995-05-17 キヤノン株式会社 露光装置
JP2535889B2 (ja) * 1987-03-26 1996-09-18 株式会社ニコン 投影光学装置
EP0568478A1 (en) * 1992-04-29 1993-11-03 International Business Machines Corporation Darkfield alignment system using a confocal spatial filter
US5737122A (en) * 1992-05-01 1998-04-07 Electro Scientific Industries, Inc. Illumination system for OCR of indicia on a substrate
US5231536A (en) * 1992-05-01 1993-07-27 Xrl, Inc. Robust, LED illumination system for OCR of indicia on a substrate
JPH06310400A (ja) * 1993-04-12 1994-11-04 Svg Lithography Syst Inc 軸上マスクとウェーハ直線配列システム
WO1995035506A2 (en) * 1994-06-17 1995-12-28 Kensington Laboratories, Inc. Scribe mark reader
US5805290A (en) * 1996-05-02 1998-09-08 International Business Machines Corporation Method of optical metrology of unresolved pattern arrays
GB2323664A (en) 1997-03-25 1998-09-30 Dek Printing Machines Ltd Viewing and imaging systems
US5929997A (en) * 1997-07-02 1999-07-27 Winbond Electronics Corp. Alignment-mark measurements on the backside of a wafer for synchronous wafer alignment
US6469793B1 (en) 1999-08-10 2002-10-22 Svg Lithography Systems, Inc. Multi-channel grating interference alignment sensor
US6525818B1 (en) * 2000-02-08 2003-02-25 Infineon Technologies Ag Overlay alignment system using polarization schemes
US20040144760A1 (en) 2002-05-17 2004-07-29 Cahill Steven P. Method and system for marking a workpiece such as a semiconductor wafer and laser marker for use therein
US7118370B2 (en) * 2002-08-30 2006-10-10 The Boeing Company Composite spar drape forming machine
US20050010310A1 (en) * 2003-07-11 2005-01-13 Touzov Igor Victorovich Method of alignment for precision tools.
JP2005279659A (ja) * 2004-03-26 2005-10-13 Toshiba Corp レーザマーキング方法、レーザマーキング装置、マーク読取方法
US7116403B2 (en) * 2004-06-28 2006-10-03 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
US7177012B2 (en) * 2004-10-18 2007-02-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
IL188029A0 (en) * 2007-12-10 2008-11-03 Nova Measuring Instr Ltd Optical method and system
TWI503520B (zh) * 2011-01-19 2015-10-11 Nova Measuring Instr Ltd 光學系統及在三維構造中之量測方法
CN103309163B (zh) * 2012-03-07 2015-08-26 上海微电子装备有限公司 外参考干涉硅片对准系统
CN106292203B (zh) * 2015-05-24 2019-01-29 上海微电子装备（集团）股份有限公司 一种自动调焦的对准系统及对准方法
DE102015224522B4 (de) * 2015-12-08 2018-06-21 Carl Zeiss Smt Gmbh Beleuchtungssystem einer mikrolithographischen Projektionsanlage und Verfahren zum Betreiben eines solchen Systems
CN107331643B (zh) * 2016-04-29 2021-02-12 上海微电子装备（集团）股份有限公司 对准装置及其方法
US12315839B2 (en) 2022-01-11 2025-05-27 Changxin Memory Technologies, Inc. Wafer bonding device and wafer bonding method
CN116469785A (zh) * 2022-01-11 2023-07-21 长鑫存储技术有限公司 一种晶圆键合设备以及晶圆键合方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3355979A (en) * 1963-12-31 1967-12-05 Theodore E Wirtanen Attachment for a sighting device for sighting in opposite directions perpendicular to the optical axis of the device
US3684384A (en) * 1969-03-17 1972-08-15 Hitachi Ltd Positioning arrangement and face down bonder incorporating the same
US3652163A (en) * 1969-05-02 1972-03-28 Ts Lab Astyki Photometer for observation instruments mainly for microscopes
US3704061A (en) * 1970-03-25 1972-11-28 David Neil Travis Wavelength selective mirror systems
JPS5117297B1 (en, 2012) * 1971-03-11 1976-06-01
CH600362A5 (en, 2012) * 1976-12-23 1978-06-15 Bbc Brown Boveri & Cie
DE2843282A1 (de) * 1977-10-05 1979-04-12 Canon Kk Fotoelektrische erfassungsvorrichtung
DE2900921C2 (de) * 1979-01-11 1981-06-04 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren zum Projektionskopieren von Masken auf ein Werkstück
DE2905636C2 (de) * 1979-02-14 1985-06-20 Censor Patent- Und Versuchs-Anstalt, Vaduz Verfahren zum Kopieren von Masken auf ein Werkstück
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS5852826A (ja) * 1981-09-24 1983-03-29 Canon Inc 位置合わせ信号処理装置
US4474469A (en) * 1982-04-19 1984-10-02 Northern Telecom Limited Precise positioning of optical fibers

Also Published As

Publication number Publication date
US5048968A (en) 1991-09-17
GB2130738A (en) 1984-06-06
DE3337874A1 (de) 1984-04-26
GB8327927D0 (en) 1983-11-23
GB2130738B (en) 1986-04-16
DE3337874C2 (en, 2012) 1991-02-07
JPS5972728A (ja) 1984-04-24

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