JPS6124816B2 - - Google Patents
Info
- Publication number
- JPS6124816B2 JPS6124816B2 JP52120735A JP12073577A JPS6124816B2 JP S6124816 B2 JPS6124816 B2 JP S6124816B2 JP 52120735 A JP52120735 A JP 52120735A JP 12073577 A JP12073577 A JP 12073577A JP S6124816 B2 JPS6124816 B2 JP S6124816B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- wafer
- photoelectric
- scribe line
- alignment mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12073577A JPS5453967A (en) | 1977-10-07 | 1977-10-07 | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12073577A JPS5453967A (en) | 1977-10-07 | 1977-10-07 | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5453967A JPS5453967A (en) | 1979-04-27 |
| JPS6124816B2 true JPS6124816B2 (en, 2012) | 1986-06-12 |
Family
ID=14793682
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12073577A Granted JPS5453967A (en) | 1977-10-07 | 1977-10-07 | Mask and wafer for semiconductor circuit manufacture and their alignment unit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5453967A (en, 2012) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5719726A (en) * | 1980-07-10 | 1982-02-02 | Nippon Kogaku Kk <Nikon> | Positioning device |
| JPS5788414A (en) * | 1980-11-21 | 1982-06-02 | Seiko Epson Corp | Alignment device |
| JPH0722179B2 (ja) * | 1985-12-27 | 1995-03-08 | 日本電気株式会社 | 半導体ウエ−ハの位置合せマ−クの形成方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5729045B2 (en, 2012) * | 1974-12-27 | 1982-06-21 | ||
| JPS5858807B2 (ja) * | 1975-05-30 | 1983-12-27 | 株式会社日立製作所 | フオトマスク |
-
1977
- 1977-10-07 JP JP12073577A patent/JPS5453967A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5453967A (en) | 1979-04-27 |
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