JPS6489427A - Connecting accuracy measuring method in lithography apparatus - Google Patents
Connecting accuracy measuring method in lithography apparatusInfo
- Publication number
- JPS6489427A JPS6489427A JP62246165A JP24616587A JPS6489427A JP S6489427 A JPS6489427 A JP S6489427A JP 62246165 A JP62246165 A JP 62246165A JP 24616587 A JP24616587 A JP 24616587A JP S6489427 A JPS6489427 A JP S6489427A
- Authority
- JP
- Japan
- Prior art keywords
- drawn
- view
- field
- pattern
- measured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To measure connecting accuracy in the parallel direction highly accurately, with regard to the connecting accuracy, which is in parallel with a boundary between fields of views, by measuring a pitch between a pattern, which is formed when the field of view is drawn in the first field view, and a pattern, which is formed when the neighboring second field of view is drawn. CONSTITUTION:When connecting accuracy, which is in parallel with a boundary between fields of views, is measured, a pattern 13 is drawn when a field of view 21 on the right side is drawn. When a field of view 22 on the right side is drawn, a pattern 14 is drawn. Namely, when the left field of view 21 is drawn, the pattern 13 is formed so that the pattern 13 is made to intrude into the field of view 22. A pitch P2 between the patterns 13 and 14 is measured in a region where the patterns 13 and 14 can be measured at the same time. Thus, the pitch P2 can be measured accurately by one beam scanning, and the connecting accuracy of the right and left fields of views can be measured highly accurately.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62246165A JPS6489427A (en) | 1987-09-30 | 1987-09-30 | Connecting accuracy measuring method in lithography apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62246165A JPS6489427A (en) | 1987-09-30 | 1987-09-30 | Connecting accuracy measuring method in lithography apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6489427A true JPS6489427A (en) | 1989-04-03 |
Family
ID=17144473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62246165A Pending JPS6489427A (en) | 1987-09-30 | 1987-09-30 | Connecting accuracy measuring method in lithography apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6489427A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6417516B1 (en) | 1999-03-26 | 2002-07-09 | Nec Corporation | Electron beam lithographing method and apparatus thereof |
-
1987
- 1987-09-30 JP JP62246165A patent/JPS6489427A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6417516B1 (en) | 1999-03-26 | 2002-07-09 | Nec Corporation | Electron beam lithographing method and apparatus thereof |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0370834A3 (en) | Semiconductor device, and method of manufacture | |
KR900000683A (en) | Pattern Shape Measuring Device | |
EP0085951A3 (en) | Method and device for establishing measured values | |
ATE49295T1 (en) | OPTICAL-ELECTRONIC MEASUREMENT METHOD, A DEVICE REQUIRED FOR THIS AND THEIR USE. | |
JPS5750433A (en) | Electron beam exposure method | |
JPS6489427A (en) | Connecting accuracy measuring method in lithography apparatus | |
JPS54935A (en) | Pattern detector | |
JPS6449907A (en) | Method and device for measuring flatness of sheet material | |
JPS57148347A (en) | Measurement of connection accuracy for electron beam exposure | |
JPS5789220A (en) | Positioning method and marking for positioning | |
JPS51139353A (en) | Apparatus of measuring the positions and widths simultaneously | |
JPS5782705A (en) | Shape measuring method | |
JPS52154688A (en) | Detection of faults on surface of metal plate moving at high speed | |
JPS52123646A (en) | Scanning type length measuring apparatus | |
JPS57115841A (en) | Probing method | |
DE2962795D1 (en) | Method and device for assessing and checking the circumferential shape of an object | |
JPS5324233A (en) | Pattern examination system | |
JPS6426103A (en) | Optical type two-directional length measuring instrument | |
JPS56111225A (en) | X ray exposuring device | |
JPS55114904A (en) | Internal hole thickness measuring method | |
TW365646B (en) | Method, device of testing elongation of chains and method of measuring distance | |
JPS562523A (en) | Frequency chart for mtf measurement | |
JPS57148239A (en) | Detecting method for wiring pattern of printed circuit board | |
JPS5551308A (en) | Area measuring device for pattern inside loop region | |
JPS57184223A (en) | Test method for deflection instrument |