JPS6488306A - Method and device for measuring pattern width - Google Patents
Method and device for measuring pattern widthInfo
- Publication number
- JPS6488306A JPS6488306A JP62247384A JP24738487A JPS6488306A JP S6488306 A JPS6488306 A JP S6488306A JP 62247384 A JP62247384 A JP 62247384A JP 24738487 A JP24738487 A JP 24738487A JP S6488306 A JPS6488306 A JP S6488306A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- fet
- saw
- irradiated
- tooth wave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE:To accurately measure the width of a pattern even if the pattern is charged up by being irradiated with an electron beam EB by scanning the EB on a sample in the vicinity of both breadthwise side edge parts of the sample. CONSTITUTION:A saw-tooth wave generating circuit 21 outputs a saw-tooth wave as shown in a figure A and the wave is applied to an FET 23 through an operational amplifier 22. A control signal shown in a figure B is applied to the gate of the FET 23 from a gate area control part 24 to turn on and off the FET 23, and a saw-tooth wave whose center part is absent is obtained on its output side. This is supplied as a current i0 to an X-directional scanning coil 26 through an operational amplifier 25. Consequently, only both breadthwise edge parts 13a and 13a of the pattern are irradiated with the EB and the center part is never irradiated. Therefore, even if the pattern 13 is formed of an electric insulating material, or even if the pattern surface is stained, the pattern is not charged up and secondary electron radiation from the pattern is never affected by the charging-up operation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62247384A JPH0643886B2 (en) | 1987-09-30 | 1987-09-30 | Electrostatic material pattern width measuring method and apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62247384A JPH0643886B2 (en) | 1987-09-30 | 1987-09-30 | Electrostatic material pattern width measuring method and apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6488306A true JPS6488306A (en) | 1989-04-03 |
JPH0643886B2 JPH0643886B2 (en) | 1994-06-08 |
Family
ID=17162629
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62247384A Expired - Fee Related JPH0643886B2 (en) | 1987-09-30 | 1987-09-30 | Electrostatic material pattern width measuring method and apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0643886B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59218906A (en) * | 1983-05-27 | 1984-12-10 | Jeol Ltd | Measuring method by electronic beam |
-
1987
- 1987-09-30 JP JP62247384A patent/JPH0643886B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59218906A (en) * | 1983-05-27 | 1984-12-10 | Jeol Ltd | Measuring method by electronic beam |
Also Published As
Publication number | Publication date |
---|---|
JPH0643886B2 (en) | 1994-06-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |