JPS6473519A - Production of thin film magnetic head - Google Patents
Production of thin film magnetic headInfo
- Publication number
- JPS6473519A JPS6473519A JP22984187A JP22984187A JPS6473519A JP S6473519 A JPS6473519 A JP S6473519A JP 22984187 A JP22984187 A JP 22984187A JP 22984187 A JP22984187 A JP 22984187A JP S6473519 A JPS6473519 A JP S6473519A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- properties
- changed
- thin film
- plasma treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To completely remove a resist and to obtain stable and uniform characteristics by subjecting the resist to an oxygen plasma treatment to remove the properties-changed resist on the surface of the resist before a resist cleaning stage. CONSTITUTION:A substrate 1 is subjected to ion milling by projection of ion beams (arrows A) thereto. The properties-changed resist 3a is formed on the surface of the resist 3 at the time when an insulating protective film 2 is patterned. The properties-changed resist 3a is then removed by subjecting this substrate 1 to the oxygen plasma treatment and the resist 3 is removed by cleaning such as ultrasonic cleaning using an org. solvent. The properties- changed layer of the resist surface is removed by such oxygen plasma treatment before the resist cleaning stage, by which the complete removal of the resist in the cleaning stage is executed. The formation of the thin film coil having stable characteristics is thereby enabled.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62229841A JPH0770025B2 (en) | 1987-09-16 | 1987-09-16 | Method of manufacturing thin film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62229841A JPH0770025B2 (en) | 1987-09-16 | 1987-09-16 | Method of manufacturing thin film magnetic head |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6473519A true JPS6473519A (en) | 1989-03-17 |
JPH0770025B2 JPH0770025B2 (en) | 1995-07-31 |
Family
ID=16898522
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62229841A Expired - Fee Related JPH0770025B2 (en) | 1987-09-16 | 1987-09-16 | Method of manufacturing thin film magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0770025B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101106631B1 (en) | 2003-02-13 | 2012-01-20 | 웰스태트 테러퓨틱스 코포레이션 | Compounds for the Treatment of Metabolic Disorders |
KR20080089453A (en) | 2006-01-25 | 2008-10-06 | 웰스태트 테러퓨틱스 코포레이션 | Compounds for the treatment of metabolic disorders |
JP2009531280A (en) | 2006-01-25 | 2009-09-03 | ウェルスタット セラピューティクス コーポレイション | Compounds for treating metabolic disorders |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59104718A (en) * | 1982-12-08 | 1984-06-16 | Comput Basic Mach Technol Res Assoc | Production of thin film magnetic head |
JPS61177615A (en) * | 1985-01-31 | 1986-08-09 | Sharp Corp | Production for thin film magnetic head |
-
1987
- 1987-09-16 JP JP62229841A patent/JPH0770025B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59104718A (en) * | 1982-12-08 | 1984-06-16 | Comput Basic Mach Technol Res Assoc | Production of thin film magnetic head |
JPS61177615A (en) * | 1985-01-31 | 1986-08-09 | Sharp Corp | Production for thin film magnetic head |
Also Published As
Publication number | Publication date |
---|---|
JPH0770025B2 (en) | 1995-07-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA2034481A1 (en) | Self-aligned gate process for fabricating field emitter arrays | |
ATE399363T1 (en) | REACTION BEAM ETCHING METHOD AND THIN FILM HEAD PRODUCED BY THIS METHOD | |
DE69326651D1 (en) | Process for the production of samples | |
JPS5656636A (en) | Processing method of fine pattern | |
JPS5611613A (en) | Thin film magnetic head | |
JPS6473519A (en) | Production of thin film magnetic head | |
JPS6425419A (en) | Etching | |
JPS554727A (en) | Magnetoresistance effect type magnetic head | |
JPS5666038A (en) | Formation of micro-pattern | |
JPS5727029A (en) | Formation of mo pattern | |
JPS56115534A (en) | Formation of pattern | |
JPS6439614A (en) | Production of thin film magnetic head | |
JPS5496369A (en) | Mask forming method | |
JPS55128830A (en) | Method of working photoresist film | |
JPS56101745A (en) | Formation of microminiature electrode | |
JPS6474728A (en) | Dry etching method | |
JPS5693310A (en) | Manufacture of magnetic bubble device | |
JPS6462473A (en) | Film formation | |
EP0308902A3 (en) | Method for forming pattern by using langmuir-blodgett film | |
JPS6449231A (en) | Manufacture of semiconductor device | |
JPS51149394A (en) | A process for treating fluorine- contained resin | |
JPS5785978A (en) | Etching jig | |
JPS647621A (en) | Manufacture of mesfet | |
JPS51117871A (en) | Semiconductor substrate processing method | |
JPS5690410A (en) | Production of thin film head |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |