JPS6466905A - Manufacture of thermistor - Google Patents
Manufacture of thermistorInfo
- Publication number
- JPS6466905A JPS6466905A JP22289487A JP22289487A JPS6466905A JP S6466905 A JPS6466905 A JP S6466905A JP 22289487 A JP22289487 A JP 22289487A JP 22289487 A JP22289487 A JP 22289487A JP S6466905 A JPS6466905 A JP S6466905A
- Authority
- JP
- Japan
- Prior art keywords
- film
- resist film
- section
- resist
- inorganic insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010408 film Substances 0.000 abstract 17
- 239000007788 liquid Substances 0.000 abstract 2
- 239000010409 thin film Substances 0.000 abstract 2
- 230000002378 acidificating effect Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Landscapes
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Thermistors And Varistors (AREA)
Abstract
PURPOSE:To prevent the damage of a thermistor sintered body by forming a photo-resist film (a resist film) to one part of the surface of the thermistor sintered body, depositing a heat-resistant inorganic insulating film on the whole surface including the upper section of the film and simultaneously removing the heat-resistant inorganic insulating film on the resist film and the resist film by a resist-film removing liquid. CONSTITUTION:A thermistor sintered body is sliced to a wafer shape. A photo- resist film liquid (b) is applied, and a resist film b' is shaped to a section to which an electrode is formed. An inorganic insulating film (c) is shaped onto the whole surface. The inorganic insulating film (c) is gotten rid of simultaneously by removing the residual resist film b' by an organic solvent, and washed. A metallic thin-film (d) is formed onto the whole surface. A resist film (e) is shaped, and exposed, and a resist film e' is left to an electrode section. The metallic thin-film except the electrode section is taken off by acidic chemicals. A residual resist film f' is removed, and washed. Accordingly, a section coated with the insulating film and an exposed section are acquired simultaneously on the same surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22289487A JPS6466905A (en) | 1987-09-08 | 1987-09-08 | Manufacture of thermistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22289487A JPS6466905A (en) | 1987-09-08 | 1987-09-08 | Manufacture of thermistor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6466905A true JPS6466905A (en) | 1989-03-13 |
| JPH0421321B2 JPH0421321B2 (en) | 1992-04-09 |
Family
ID=16789531
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22289487A Granted JPS6466905A (en) | 1987-09-08 | 1987-09-08 | Manufacture of thermistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6466905A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61188502A (en) * | 1985-02-18 | 1986-08-22 | Matsushita Electric Ind Co Ltd | Preparation of optical waveguide |
-
1987
- 1987-09-08 JP JP22289487A patent/JPS6466905A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61188502A (en) * | 1985-02-18 | 1986-08-22 | Matsushita Electric Ind Co Ltd | Preparation of optical waveguide |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0421321B2 (en) | 1992-04-09 |
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