JPS6464274A - Tunnel type josephson junction - Google Patents
Tunnel type josephson junctionInfo
- Publication number
- JPS6464274A JPS6464274A JP62219150A JP21915087A JPS6464274A JP S6464274 A JPS6464274 A JP S6464274A JP 62219150 A JP62219150 A JP 62219150A JP 21915087 A JP21915087 A JP 21915087A JP S6464274 A JPS6464274 A JP S6464274A
- Authority
- JP
- Japan
- Prior art keywords
- barrier layer
- tunnel barrier
- deterioration
- electrode
- boron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000004888 barrier function Effects 0.000 abstract 8
- 239000010410 layer Substances 0.000 abstract 8
- 230000006866 deterioration Effects 0.000 abstract 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 3
- 229910052796 boron Inorganic materials 0.000 abstract 3
- 229910052760 oxygen Inorganic materials 0.000 abstract 3
- 239000001301 oxygen Substances 0.000 abstract 3
- 229910052582 BN Inorganic materials 0.000 abstract 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 2
- 239000011229 interlayer Substances 0.000 abstract 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 abstract 1
- 229910010271 silicon carbide Inorganic materials 0.000 abstract 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 1
- 239000002356 single layer Substances 0.000 abstract 1
Landscapes
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62219150A JPS6464274A (en) | 1987-09-03 | 1987-09-03 | Tunnel type josephson junction |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62219150A JPS6464274A (en) | 1987-09-03 | 1987-09-03 | Tunnel type josephson junction |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6464274A true JPS6464274A (en) | 1989-03-10 |
JPH054828B2 JPH054828B2 (enrdf_load_stackoverflow) | 1993-01-20 |
Family
ID=16730990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62219150A Granted JPS6464274A (en) | 1987-09-03 | 1987-09-03 | Tunnel type josephson junction |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6464274A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019504480A (ja) * | 2015-12-08 | 2019-02-14 | ノースロップ グラマン システムズ コーポレイションNorthrop Grumman Systems Corporation | 超電導デバイス用の非酸化物系誘電体 |
US10608159B2 (en) | 2016-11-15 | 2020-03-31 | Northrop Grumman Systems Corporation | Method of making a superconductor device |
US10763419B2 (en) | 2017-06-02 | 2020-09-01 | Northrop Grumman Systems Corporation | Deposition methodology for superconductor interconnects |
US10985059B2 (en) | 2018-11-01 | 2021-04-20 | Northrop Grumman Systems Corporation | Preclean and dielectric deposition methodology for superconductor interconnect fabrication |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS582082A (ja) * | 1981-06-29 | 1983-01-07 | Nec Corp | ジヨセフソン接合素子 |
JPS6448315A (en) * | 1987-08-14 | 1989-02-22 | Hitachi Metals Ltd | High temperature superconductor |
-
1987
- 1987-09-03 JP JP62219150A patent/JPS6464274A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS582082A (ja) * | 1981-06-29 | 1983-01-07 | Nec Corp | ジヨセフソン接合素子 |
JPS6448315A (en) * | 1987-08-14 | 1989-02-22 | Hitachi Metals Ltd | High temperature superconductor |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019504480A (ja) * | 2015-12-08 | 2019-02-14 | ノースロップ グラマン システムズ コーポレイションNorthrop Grumman Systems Corporation | 超電導デバイス用の非酸化物系誘電体 |
US10608159B2 (en) | 2016-11-15 | 2020-03-31 | Northrop Grumman Systems Corporation | Method of making a superconductor device |
US10763419B2 (en) | 2017-06-02 | 2020-09-01 | Northrop Grumman Systems Corporation | Deposition methodology for superconductor interconnects |
US10985059B2 (en) | 2018-11-01 | 2021-04-20 | Northrop Grumman Systems Corporation | Preclean and dielectric deposition methodology for superconductor interconnect fabrication |
Also Published As
Publication number | Publication date |
---|---|
JPH054828B2 (enrdf_load_stackoverflow) | 1993-01-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |