JPS6464220A - Forming method for resist pattern - Google Patents

Forming method for resist pattern

Info

Publication number
JPS6464220A
JPS6464220A JP22169787A JP22169787A JPS6464220A JP S6464220 A JPS6464220 A JP S6464220A JP 22169787 A JP22169787 A JP 22169787A JP 22169787 A JP22169787 A JP 22169787A JP S6464220 A JPS6464220 A JP S6464220A
Authority
JP
Japan
Prior art keywords
positive type
type resist
resist
baking
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22169787A
Other languages
English (en)
Inventor
Setsu Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP22169787A priority Critical patent/JPS6464220A/ja
Publication of JPS6464220A publication Critical patent/JPS6464220A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Weting (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP22169787A 1987-09-03 1987-09-03 Forming method for resist pattern Pending JPS6464220A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22169787A JPS6464220A (en) 1987-09-03 1987-09-03 Forming method for resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22169787A JPS6464220A (en) 1987-09-03 1987-09-03 Forming method for resist pattern

Publications (1)

Publication Number Publication Date
JPS6464220A true JPS6464220A (en) 1989-03-10

Family

ID=16770860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22169787A Pending JPS6464220A (en) 1987-09-03 1987-09-03 Forming method for resist pattern

Country Status (1)

Country Link
JP (1) JPS6464220A (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0383064A (ja) * 1989-07-28 1991-04-09 American Teleph & Telegr Co <Att> 集積回路半導体デバイスのエッチング法
US6284400B1 (en) 1995-05-05 2001-09-04 Rayovac Corporation Metal-air cathode can, and electrochemical cell made therewith
JP2002148808A (ja) * 2000-11-10 2002-05-22 Matsushita Electric Ind Co Ltd 感光性樹脂の塗布方法及び乾燥方法
KR100380883B1 (ko) * 2000-04-20 2003-04-18 한국과학기술원 미세 패턴 및 메탈 라인 형성 방법
US6822420B2 (en) 2000-03-14 2004-11-23 Matsushita Electric Industrial Co., Ltd. Battery power source device including rechargeable battery and circuit board joined thereto
US7027227B2 (en) 2003-01-22 2006-04-11 Canon Kabushiki Kaisha Three-dimensional structure forming method
JP2007525029A (ja) * 2004-02-23 2007-08-30 エーエスエムエル ネザーランズ ビー．ブイ． デバイス製造方法および基板
JP2016127234A (ja) * 2015-01-08 2016-07-11 株式会社アルバック レジスト構造体の製造方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0383064A (ja) * 1989-07-28 1991-04-09 American Teleph & Telegr Co <Att> 集積回路半導体デバイスのエッチング法
US6284400B1 (en) 1995-05-05 2001-09-04 Rayovac Corporation Metal-air cathode can, and electrochemical cell made therewith
US6822420B2 (en) 2000-03-14 2004-11-23 Matsushita Electric Industrial Co., Ltd. Battery power source device including rechargeable battery and circuit board joined thereto
KR100380883B1 (ko) * 2000-04-20 2003-04-18 한국과학기술원 미세 패턴 및 메탈 라인 형성 방법
JP2002148808A (ja) * 2000-11-10 2002-05-22 Matsushita Electric Ind Co Ltd 感光性樹脂の塗布方法及び乾燥方法
US7027227B2 (en) 2003-01-22 2006-04-11 Canon Kabushiki Kaisha Three-dimensional structure forming method
JP2007525029A (ja) * 2004-02-23 2007-08-30 エーエスエムエル ネザーランズ ビー．ブイ． デバイス製造方法および基板
US7892903B2 (en) 2004-02-23 2011-02-22 Asml Netherlands B.V. Device manufacturing method and substrate comprising multiple resist layers
JP2016127234A (ja) * 2015-01-08 2016-07-11 株式会社アルバック レジスト構造体の製造方法

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