JPS6453589A - Wavelength controller for excimer laser - Google Patents

Wavelength controller for excimer laser

Info

Publication number
JPS6453589A
JPS6453589A JP62210821A JP21082187A JPS6453589A JP S6453589 A JPS6453589 A JP S6453589A JP 62210821 A JP62210821 A JP 62210821A JP 21082187 A JP21082187 A JP 21082187A JP S6453589 A JPS6453589 A JP S6453589A
Authority
JP
Japan
Prior art keywords
central wavelength
wavelength
power
excimer laser
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62210821A
Other languages
Japanese (ja)
Other versions
JP2649357B2 (en
Inventor
Osamu Wakabayashi
Noriaki Itou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Komatsu Ltd
Original Assignee
Komatsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Ltd filed Critical Komatsu Ltd
Priority to JP62210821A priority Critical patent/JP2649357B2/en
Priority to PCT/JP1988/000841 priority patent/WO1989002175A1/en
Priority to DE19883890693 priority patent/DE3890693T1/en
Priority to US07/465,184 priority patent/US5081635A/en
Publication of JPS6453589A publication Critical patent/JPS6453589A/en
Application granted granted Critical
Publication of JP2649357B2 publication Critical patent/JP2649357B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
    • H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To obtain a stable power by a method wherein the central wavelength of an output laser beam is fixed at a required wavelength by a first control means which controls the central wavelength and the power at the central wavelength is controlled to be maximum by a second control means which performs superposition control. CONSTITUTION:An excimer laser 10 has a rear mirror 1, a laser chamber 2 and a front mirror 3. Two etalons 4 and 5 whose free spectral ranges are different from each other are provided between the rear mirror 1 and the laser chamber 2. A part of the outputted laser beam is taken out through a beam splitter 11 as a sampled beam and inputted to an oscillation central wavelength and central wavelength power detector 14 through a lens 12 and an optical fiber 13. The detector 14 detects the oscillation central wavelength lambda and the power Plambda at the central wavelength of the excimer laser 10. A wavelength controller 15 controls the wavelength selection characteristics of the etalons 4 and 5 through a driver 16 so as to make the central wavelength of the output beam of the excimer laser 10 agree with a required wavelength and make the central wavelength power maximum.
JP62210821A 1987-08-25 1987-08-25 Excimer laser wavelength controller Expired - Lifetime JP2649357B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP62210821A JP2649357B2 (en) 1987-08-25 1987-08-25 Excimer laser wavelength controller
PCT/JP1988/000841 WO1989002175A1 (en) 1987-08-25 1988-08-25 Device for controlling the output of excimer laser
DE19883890693 DE3890693T1 (en) 1987-08-25 1988-08-25 METHOD FOR REGULATING THE OUTPUT OF AN EXCIMER LASER DEVICE
US07/465,184 US5081635A (en) 1987-08-25 1988-08-25 Apparatus for controlling output from an excimer laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62210821A JP2649357B2 (en) 1987-08-25 1987-08-25 Excimer laser wavelength controller

Publications (2)

Publication Number Publication Date
JPS6453589A true JPS6453589A (en) 1989-03-01
JP2649357B2 JP2649357B2 (en) 1997-09-03

Family

ID=16595678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62210821A Expired - Lifetime JP2649357B2 (en) 1987-08-25 1987-08-25 Excimer laser wavelength controller

Country Status (1)

Country Link
JP (1) JP2649357B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01115183A (en) * 1987-10-28 1989-05-08 Mitsubishi Electric Corp Laser wavelength stabilization and wavelength stabilized laser apparatus
JPH02306679A (en) * 1989-05-22 1990-12-20 Komatsu Ltd Wavelength controller for laser
WO1991016745A1 (en) * 1990-04-16 1991-10-31 Mitsui Petrochemical Industries, Ltd. Laser device
JP2001267673A (en) * 2000-02-09 2001-09-28 Cymer Inc Laser bandwidth controlling technology
JP2012178534A (en) * 2011-02-02 2012-09-13 Gigaphoton Inc Optical system and extreme ultraviolet light generation system using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01115183A (en) * 1987-10-28 1989-05-08 Mitsubishi Electric Corp Laser wavelength stabilization and wavelength stabilized laser apparatus
JPH02306679A (en) * 1989-05-22 1990-12-20 Komatsu Ltd Wavelength controller for laser
WO1991016745A1 (en) * 1990-04-16 1991-10-31 Mitsui Petrochemical Industries, Ltd. Laser device
JP2001267673A (en) * 2000-02-09 2001-09-28 Cymer Inc Laser bandwidth controlling technology
JP2012178534A (en) * 2011-02-02 2012-09-13 Gigaphoton Inc Optical system and extreme ultraviolet light generation system using the same

Also Published As

Publication number Publication date
JP2649357B2 (en) 1997-09-03

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