JPS6457775A - Excimer laser - Google Patents
Excimer laserInfo
- Publication number
- JPS6457775A JPS6457775A JP62214399A JP21439987A JPS6457775A JP S6457775 A JPS6457775 A JP S6457775A JP 62214399 A JP62214399 A JP 62214399A JP 21439987 A JP21439987 A JP 21439987A JP S6457775 A JPS6457775 A JP S6457775A
- Authority
- JP
- Japan
- Prior art keywords
- angle
- etalons
- wavelength
- wavelength selecting
- smaller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
- H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
Abstract
PURPOSE:To set an outer wavelength selecting element to an angle smaller than a geometrical angle for generating a parasitic oscillation and to improve wavelength selecting performance and resonance efficiency by disposing an etalon having smallest free spectral range (FSR) of a plurality of etalons at a position nearest to a rear mirror. CONSTITUTION:An excimer laser light output from an excimer laser 1 is separated by a beam splitter 7 to an exposure beam and a control beam, the control beam is guided to a wavelength control system 9, and used to control to alter the wavelength selecting characteristics of etalons 5, 6 to obtain a desired wavelength laser light, such as the angle of the etalons 5, 6 with respect to an optical axis. When the etalon 6 having smaller FSR is disposed outside, its angle is set to that smaller than a geometrical angle theta1 for generating a parasitic oscillation. Thus, wavelength selecting performance and resonance efficiency can be further improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62214399A JPS6457775A (en) | 1987-08-28 | 1987-08-28 | Excimer laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62214399A JPS6457775A (en) | 1987-08-28 | 1987-08-28 | Excimer laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6457775A true JPS6457775A (en) | 1989-03-06 |
Family
ID=16655143
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62214399A Pending JPS6457775A (en) | 1987-08-28 | 1987-08-28 | Excimer laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6457775A (en) |
-
1987
- 1987-08-28 JP JP62214399A patent/JPS6457775A/en active Pending
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