JPS6444439A - Positive photoresist composition - Google Patents
Positive photoresist compositionInfo
- Publication number
- JPS6444439A JPS6444439A JP63185673A JP18567388A JPS6444439A JP S6444439 A JPS6444439 A JP S6444439A JP 63185673 A JP63185673 A JP 63185673A JP 18567388 A JP18567388 A JP 18567388A JP S6444439 A JPS6444439 A JP S6444439A
- Authority
- JP
- Japan
- Prior art keywords
- compds
- kinds
- hydroxyl
- quinoneazido
- alkali
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19873724791 DE3724791A1 (de) | 1987-07-27 | 1987-07-27 | Positiv-fotoresist-zusammensetzungen |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6444439A true JPS6444439A (en) | 1989-02-16 |
Family
ID=6332421
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63185673A Pending JPS6444439A (en) | 1987-07-27 | 1988-07-27 | Positive photoresist composition |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0301332B1 (ja) |
JP (1) | JPS6444439A (ja) |
KR (1) | KR890002714A (ja) |
AT (1) | ATE103084T1 (ja) |
DE (2) | DE3724791A1 (ja) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0284648A (ja) * | 1988-06-30 | 1990-03-26 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線樹脂組成物 |
JPH0328849A (ja) * | 1989-06-26 | 1991-02-07 | Mitsubishi Kasei Corp | ポジ型フォトレジスト組成物 |
JPH03119358A (ja) * | 1989-10-02 | 1991-05-21 | Nippon Zeon Co Ltd | ポジ型レジスト組成物 |
JPH03200250A (ja) * | 1989-12-28 | 1991-09-02 | Nippon Zeon Co Ltd | ポジ型レジスト組成物 |
JPH03200252A (ja) * | 1989-12-28 | 1991-09-02 | Nippon Zeon Co Ltd | ポジ型レジスト組成物 |
JPH05127376A (ja) * | 1991-04-26 | 1993-05-25 | Nippon Zeon Co Ltd | ポジ型レジスト組成物 |
JPH05289332A (ja) * | 1992-04-14 | 1993-11-05 | Tokyo Ohka Kogyo Co Ltd | レジストパターン形成用材料 |
EP0786699A1 (en) | 1996-01-22 | 1997-07-30 | Fuji Photo Film Co., Ltd. | Positive photoresist composition |
JP2814308B2 (ja) * | 1992-09-24 | 1998-10-22 | パーキン―エルマー コーポレーション | 粘性の電気泳動ポリマー媒質および方法 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3811040A1 (de) * | 1988-03-31 | 1989-10-19 | Ciba Geigy Ag | Im nahen uv hochaufloesende positiv-fotoresists |
DE3835737A1 (de) * | 1988-10-20 | 1990-04-26 | Ciba Geigy Ag | Positiv-fotoresists mit erhoehter thermischer stabilitaet |
EP0384892A1 (de) * | 1989-02-23 | 1990-08-29 | Ciba-Geigy Ag | Photoresist-Zusammensetzungen |
US5200293A (en) * | 1989-02-23 | 1993-04-06 | Ciba-Geigy Corporation | Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound |
US5256521A (en) * | 1989-09-19 | 1993-10-26 | Ocg Microelectronic Materials, Inc. | Process of developing a positive pattern in an O-quinone diazide photoresist containing a tris-(hydroxyphenyl) lower alkane compound sensitivity enhancer |
US5215856A (en) * | 1989-09-19 | 1993-06-01 | Ocg Microelectronic Materials, Inc. | Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhancers for o-quinonediazide containing radiation-sensitive compositions and elements |
US5260162A (en) * | 1990-12-17 | 1993-11-09 | Khanna Dinesh N | Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers |
US5302489A (en) * | 1991-10-29 | 1994-04-12 | E. I. Du Pont De Nemours And Company | Positive photoresist compositions containing base polymer which is substantially insoluble at pH between 7 and 10, quinonediazide acid generator and silanol solubility enhancer |
US5362599A (en) * | 1991-11-14 | 1994-11-08 | International Business Machines Corporations | Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds |
DE4401940A1 (de) * | 1994-01-24 | 1995-07-27 | Hoechst Ag | Positiv arbeitendes Aufzeichnungsmaterial mit verbesserter Entwickelbarkeit |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60121445A (ja) * | 1983-12-06 | 1985-06-28 | Japan Synthetic Rubber Co Ltd | 集積回路作製用ポジ型感光性樹脂組成物 |
JPS60150047A (ja) * | 1984-01-17 | 1985-08-07 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
JPS60164740A (ja) * | 1984-02-06 | 1985-08-27 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
JPS6324244A (ja) * | 1986-05-02 | 1988-02-01 | ヘキスト・セラニーズ・コーポレイシヨン | フォトレジスト及び該フォトレジストを有する物品の製法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1494640A (en) * | 1974-12-24 | 1977-12-07 | Fuji Photo Film Co Ltd | Image-forming on light-sensitive element containing a quinone diazide |
DE3039926A1 (de) * | 1980-10-23 | 1982-05-27 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial |
DE3718416A1 (de) * | 1987-06-02 | 1988-12-15 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung |
-
1987
- 1987-07-27 DE DE19873724791 patent/DE3724791A1/de not_active Withdrawn
-
1988
- 1988-07-15 EP EP88111371A patent/EP0301332B1/de not_active Expired - Lifetime
- 1988-07-15 AT AT88111371T patent/ATE103084T1/de active
- 1988-07-15 DE DE88111371T patent/DE3888420D1/de not_active Expired - Fee Related
- 1988-07-26 KR KR1019880009376A patent/KR890002714A/ko not_active Application Discontinuation
- 1988-07-27 JP JP63185673A patent/JPS6444439A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60121445A (ja) * | 1983-12-06 | 1985-06-28 | Japan Synthetic Rubber Co Ltd | 集積回路作製用ポジ型感光性樹脂組成物 |
JPS60150047A (ja) * | 1984-01-17 | 1985-08-07 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
JPS60164740A (ja) * | 1984-02-06 | 1985-08-27 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
JPS6324244A (ja) * | 1986-05-02 | 1988-02-01 | ヘキスト・セラニーズ・コーポレイシヨン | フォトレジスト及び該フォトレジストを有する物品の製法 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0284648A (ja) * | 1988-06-30 | 1990-03-26 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線樹脂組成物 |
JPH0328849A (ja) * | 1989-06-26 | 1991-02-07 | Mitsubishi Kasei Corp | ポジ型フォトレジスト組成物 |
JPH03119358A (ja) * | 1989-10-02 | 1991-05-21 | Nippon Zeon Co Ltd | ポジ型レジスト組成物 |
JPH03200250A (ja) * | 1989-12-28 | 1991-09-02 | Nippon Zeon Co Ltd | ポジ型レジスト組成物 |
JPH03200252A (ja) * | 1989-12-28 | 1991-09-02 | Nippon Zeon Co Ltd | ポジ型レジスト組成物 |
JPH05127376A (ja) * | 1991-04-26 | 1993-05-25 | Nippon Zeon Co Ltd | ポジ型レジスト組成物 |
JPH05289332A (ja) * | 1992-04-14 | 1993-11-05 | Tokyo Ohka Kogyo Co Ltd | レジストパターン形成用材料 |
JP2814308B2 (ja) * | 1992-09-24 | 1998-10-22 | パーキン―エルマー コーポレーション | 粘性の電気泳動ポリマー媒質および方法 |
EP0786699A1 (en) | 1996-01-22 | 1997-07-30 | Fuji Photo Film Co., Ltd. | Positive photoresist composition |
Also Published As
Publication number | Publication date |
---|---|
EP0301332B1 (de) | 1994-03-16 |
DE3724791A1 (de) | 1989-02-09 |
KR890002714A (ko) | 1989-04-11 |
DE3888420D1 (de) | 1994-04-21 |
EP0301332A2 (de) | 1989-02-01 |
ATE103084T1 (de) | 1994-04-15 |
EP0301332A3 (en) | 1989-07-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6444439A (en) | Positive photoresist composition | |
AU2623884A (en) | Water based epoxy compositions | |
KR930004807A (ko) | 개선된 해상력 및 감소된 결정화 경향을 갖는 포지티브 감광성 내식막 조성물 및 신규 테트라(히드록시페닐)알칸 | |
EP0718693A3 (en) | Photoresist compositions and components | |
JPS5532070A (en) | Photosensitive resin composition | |
JPS5562446A (en) | Photosensitive resin composition for screen printing plate | |
DE3852690D1 (de) | Positiv arbeitendes lichtempfindliches Gemisch, enthaltend einen Farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches Aufzeichnungsmaterial. | |
JPS5587151A (en) | Developing solution composition for lithographic printing plate | |
AU542387B2 (en) | Naphthoquinone diazide sulfonic ester | |
JPS6480944A (en) | Photosensitive resin composition | |
KR900002125A (ko) | 내식막 조성물 | |
EP0353666A3 (en) | Photosensitive agent,photosensitive resin composition containing same, and method of image formation using the composition | |
KR960038487A (ko) | 파지티브 포토레지스트 조성물 | |
ATE435441T1 (de) | Lösemittelsystem für positiv-arbeitende photoresiste | |
JPS646948A (en) | Positive type photosensitive resin composition and production thereof | |
JPS642034A (en) | Photoresist composition | |
JPS6419345A (en) | High contrast positive photoresist developer containing alkanol amine | |
JPS56121031A (en) | Photosensitive composition | |
JPS5687046A (en) | Sensitizer for organic photosensitive material | |
EP0369379A3 (en) | Image forming method | |
JPS55100548A (en) | Developer | |
JPS56132345A (en) | Developer composition for lithographic plate | |
JPS55126235A (en) | Photosensitive composition | |
JPS57128702A (en) | Photopolymerizable composition | |
JPS6484246A (en) | Photosensitive composition and photosensitive copying material |