JPS644336B2 - - Google Patents
Info
- Publication number
- JPS644336B2 JPS644336B2 JP6939080A JP6939080A JPS644336B2 JP S644336 B2 JPS644336 B2 JP S644336B2 JP 6939080 A JP6939080 A JP 6939080A JP 6939080 A JP6939080 A JP 6939080A JP S644336 B2 JPS644336 B2 JP S644336B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- film
- temperature
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010408 film Substances 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 13
- 239000010409 thin film Substances 0.000 claims description 12
- 230000005291 magnetic effect Effects 0.000 claims description 10
- 239000007789 gas Substances 0.000 claims description 7
- 230000001590 oxidative effect Effects 0.000 claims description 7
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000012159 carrier gas Substances 0.000 claims description 3
- 229910052595 hematite Inorganic materials 0.000 claims description 3
- 239000011019 hematite Substances 0.000 claims description 3
- LIKBJVNGSGBSGK-UHFFFAOYSA-N iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Fe+3].[Fe+3] LIKBJVNGSGBSGK-UHFFFAOYSA-N 0.000 claims description 3
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 229910001566 austenite Inorganic materials 0.000 description 12
- 238000000576 coating method Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000005307 ferromagnetism Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 238000007521 mechanical polishing technique Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Compounds Of Iron (AREA)
- Chemical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6939080A JPS56164020A (en) | 1980-05-23 | 1980-05-23 | Production of magnetic thin film of oxide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6939080A JPS56164020A (en) | 1980-05-23 | 1980-05-23 | Production of magnetic thin film of oxide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56164020A JPS56164020A (en) | 1981-12-16 |
| JPS644336B2 true JPS644336B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-01-25 |
Family
ID=13401216
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6939080A Granted JPS56164020A (en) | 1980-05-23 | 1980-05-23 | Production of magnetic thin film of oxide |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56164020A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60116118A (ja) * | 1983-11-29 | 1985-06-22 | Tdk Corp | 磁性薄膜 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5323957B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-06-01 | 1978-07-18 | ||
| JPS5265898A (en) * | 1975-11-26 | 1977-05-31 | Nippon Telegr & Teleph Corp <Ntt> | Preparing oxidized magnetic thin film |
-
1980
- 1980-05-23 JP JP6939080A patent/JPS56164020A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56164020A (en) | 1981-12-16 |