JPS6439750A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6439750A JPS6439750A JP19690387A JP19690387A JPS6439750A JP S6439750 A JPS6439750 A JP S6439750A JP 19690387 A JP19690387 A JP 19690387A JP 19690387 A JP19690387 A JP 19690387A JP S6439750 A JPS6439750 A JP S6439750A
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- photoresist
- film
- hole
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE:To prevent a resist from peeling and a resist pattern configuration from deteriorating in manufacturing a through hole, by applying an undoped silicon coating to the whole surface of a second insulating film and then applying a photoresist thereon. CONSTITUTION:A first insulating film 14 formed of a silicon oxide film or a silicon nitride film is formed so as to cover a wiring pattern 13. Then, liquid phase oxide film is applied and baked, and a second insulating film 15 is applied to form an interlayer insulating film. Then, a undoped silicon coating 16 is formed on the whole surface of the second insulating film 15. A photoresist is applied by spin-on operation thereon and then exposed to light and developed to form a through hole pattern of a photoresist film 17. Since the above- described silicon coating 16 has the property of intercepting light, it is possible to prevent deterioration of the through hole configuration of the photoresist layer 17 due to the reflection of the exposed light on the surface of the wiring pattern layer 17. In addition, since the coating 16 adheres to the second insulating film 15 and the photoresist layer 17 strongly, it is possible to strongth adhere the photoresist layer 17 to the interlayer insulating film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19690387A JPS6439750A (en) | 1987-08-06 | 1987-08-06 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19690387A JPS6439750A (en) | 1987-08-06 | 1987-08-06 | Manufacture of semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6439750A true JPS6439750A (en) | 1989-02-10 |
Family
ID=16365563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19690387A Pending JPS6439750A (en) | 1987-08-06 | 1987-08-06 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6439750A (en) |
-
1987
- 1987-08-06 JP JP19690387A patent/JPS6439750A/en active Pending
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