JPS6431339A - Charged particle beam device - Google Patents
Charged particle beam deviceInfo
- Publication number
- JPS6431339A JPS6431339A JP62186916A JP18691687A JPS6431339A JP S6431339 A JPS6431339 A JP S6431339A JP 62186916 A JP62186916 A JP 62186916A JP 18691687 A JP18691687 A JP 18691687A JP S6431339 A JPS6431339 A JP S6431339A
- Authority
- JP
- Japan
- Prior art keywords
- dust
- electron beam
- metal mesh
- focal point
- radiated surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62186916A JPS6431339A (en) | 1987-07-27 | 1987-07-27 | Charged particle beam device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62186916A JPS6431339A (en) | 1987-07-27 | 1987-07-27 | Charged particle beam device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6431339A true JPS6431339A (en) | 1989-02-01 |
Family
ID=16196937
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62186916A Pending JPS6431339A (en) | 1987-07-27 | 1987-07-27 | Charged particle beam device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6431339A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008041464A (ja) * | 2006-08-08 | 2008-02-21 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
JP2009004161A (ja) * | 2007-06-20 | 2009-01-08 | Ebara Corp | 試料表面上の異物除去方法及びこれに用いる荷電粒子装置 |
JP2012064567A (ja) * | 2010-08-03 | 2012-03-29 | Ebara Corp | 異物付着防止機能を備えた電子線検査装置及び方法 |
WO2014061738A1 (ja) * | 2012-10-18 | 2014-04-24 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置内の異物除去方法、及び荷電粒子線装置 |
US9194826B2 (en) | 2007-04-16 | 2015-11-24 | Ebara Corporation | Electron beam apparatus and sample observation method using the same |
-
1987
- 1987-07-27 JP JP62186916A patent/JPS6431339A/ja active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008041464A (ja) * | 2006-08-08 | 2008-02-21 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
US9194826B2 (en) | 2007-04-16 | 2015-11-24 | Ebara Corporation | Electron beam apparatus and sample observation method using the same |
JP2009004161A (ja) * | 2007-06-20 | 2009-01-08 | Ebara Corp | 試料表面上の異物除去方法及びこれに用いる荷電粒子装置 |
JP2012064567A (ja) * | 2010-08-03 | 2012-03-29 | Ebara Corp | 異物付着防止機能を備えた電子線検査装置及び方法 |
JP2016106374A (ja) * | 2010-08-03 | 2016-06-16 | 株式会社荏原製作所 | 異物付着防止機能を備えた電子線検査装置及び方法 |
WO2014061738A1 (ja) * | 2012-10-18 | 2014-04-24 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置内の異物除去方法、及び荷電粒子線装置 |
JP2014082140A (ja) * | 2012-10-18 | 2014-05-08 | Hitachi High-Technologies Corp | 荷電粒子線装置内の異物除去方法、及び荷電粒子線装置 |
US9368319B2 (en) | 2012-10-18 | 2016-06-14 | Hitachi High-Technologies Corporation | Method for removing foreign substances in charged particle beam device, and charged particle beam device |
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