JPS6430234A - Apparatus for manufacturing semiconductor device - Google Patents
Apparatus for manufacturing semiconductor deviceInfo
- Publication number
- JPS6430234A JPS6430234A JP18720287A JP18720287A JPS6430234A JP S6430234 A JPS6430234 A JP S6430234A JP 18720287 A JP18720287 A JP 18720287A JP 18720287 A JP18720287 A JP 18720287A JP S6430234 A JPS6430234 A JP S6430234A
- Authority
- JP
- Japan
- Prior art keywords
- good
- film
- gas
- oxide film
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18720287A JPS6430234A (en) | 1987-07-27 | 1987-07-27 | Apparatus for manufacturing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18720287A JPS6430234A (en) | 1987-07-27 | 1987-07-27 | Apparatus for manufacturing semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6430234A true JPS6430234A (en) | 1989-02-01 |
Family
ID=16201879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18720287A Pending JPS6430234A (en) | 1987-07-27 | 1987-07-27 | Apparatus for manufacturing semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6430234A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998058704A1 (fr) | 1997-06-25 | 1998-12-30 | Fujikura Ltd. | Feuille ignifuge, son procede d'elaboration et structure de protection contre le feu |
WO2005020309A1 (ja) * | 2003-08-26 | 2005-03-03 | Hitachi Kokusai Electric Inc. | 半導体装置の製造方法および基板処理装置 |
WO2011152510A1 (ja) * | 2010-06-04 | 2011-12-08 | 信越化学工業株式会社 | 熱処理炉 |
-
1987
- 1987-07-27 JP JP18720287A patent/JPS6430234A/ja active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998058704A1 (fr) | 1997-06-25 | 1998-12-30 | Fujikura Ltd. | Feuille ignifuge, son procede d'elaboration et structure de protection contre le feu |
WO2005020309A1 (ja) * | 2003-08-26 | 2005-03-03 | Hitachi Kokusai Electric Inc. | 半導体装置の製造方法および基板処理装置 |
KR100766196B1 (ko) * | 2003-08-26 | 2007-10-10 | 가부시키가이샤 히다치 고쿠사이 덴키 | 반도체 장치의 제조 방법 및 기판 처리 장치 |
KR100771782B1 (ko) * | 2003-08-26 | 2007-10-30 | 가부시키가이샤 히다치 고쿠사이 덴키 | 반도체 장치의 제조 방법 및 기판 처리 장치 |
US7534730B2 (en) | 2003-08-26 | 2009-05-19 | Hitachi Kokusai Electric In. | Producing method of semiconductor device and substrate processing apparatus |
US7871938B2 (en) | 2003-08-26 | 2011-01-18 | Hitachi Kokusai Electric Inc. | Producing method of semiconductor device and substrate processing apparatus |
US8084369B2 (en) | 2003-08-26 | 2011-12-27 | Hitachi Kokusai Electric, Inc. | Producing method of semiconductor device and substrate processing apparatus |
WO2011152510A1 (ja) * | 2010-06-04 | 2011-12-08 | 信越化学工業株式会社 | 熱処理炉 |
JP2012015501A (ja) * | 2010-06-04 | 2012-01-19 | Shin Etsu Chem Co Ltd | 熱処理炉 |
CN103038865A (zh) * | 2010-06-04 | 2013-04-10 | 信越化学工业株式会社 | 热处理炉 |
US9799535B2 (en) | 2010-06-04 | 2017-10-24 | Shin-Etsu Chemical Co., Ltd. | Heat-treatment furnace |
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