JPS6424049A - Etching method - Google Patents
Etching methodInfo
- Publication number
- JPS6424049A JPS6424049A JP17689187A JP17689187A JPS6424049A JP S6424049 A JPS6424049 A JP S6424049A JP 17689187 A JP17689187 A JP 17689187A JP 17689187 A JP17689187 A JP 17689187A JP S6424049 A JPS6424049 A JP S6424049A
- Authority
- JP
- Japan
- Prior art keywords
- quartz substrate
- pattern mask
- targeted
- etching
- diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
PURPOSE:To obtain highly accurate and deep etching of complicated shape at a low cost, by etching after forming film-like diamond on a quartz substrate by a vapor phase synthetic method using pattern mask of targeted shape. CONSTITUTION:The pattern mask having targeted shape is formed on the quartz substrate and the film-like diamond is formed by the microwave plasma CVD method, etc., using CH4 + H2. Then, the pattern mask above-mentioned is cut apart from the quartz substrate to expose the shaped part to be etched. Thereafter, the exposed part is etched by immersing the quartz substrate in an etching agent such as aq. soln. of hydrofluoric acid and by dissolving off the exposed part up to targeted depth.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17689187A JPS6424049A (en) | 1987-07-15 | 1987-07-15 | Etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17689187A JPS6424049A (en) | 1987-07-15 | 1987-07-15 | Etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6424049A true JPS6424049A (en) | 1989-01-26 |
Family
ID=16021559
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17689187A Pending JPS6424049A (en) | 1987-07-15 | 1987-07-15 | Etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6424049A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020222297A1 (en) * | 2019-04-28 | 2020-11-05 | Okinawa Institute Of Science And Technology School Corporation | Method of fabricating a through glass via on a suspended nanocrystalline diamond |
-
1987
- 1987-07-15 JP JP17689187A patent/JPS6424049A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020222297A1 (en) * | 2019-04-28 | 2020-11-05 | Okinawa Institute Of Science And Technology School Corporation | Method of fabricating a through glass via on a suspended nanocrystalline diamond |
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