JPS6410243A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS6410243A
JPS6410243A JP16575587A JP16575587A JPS6410243A JP S6410243 A JPS6410243 A JP S6410243A JP 16575587 A JP16575587 A JP 16575587A JP 16575587 A JP16575587 A JP 16575587A JP S6410243 A JPS6410243 A JP S6410243A
Authority
JP
Japan
Prior art keywords
contrastenhanced
layer
resist
forming method
pattern forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16575587A
Other languages
Japanese (ja)
Inventor
Masataka Endo
Masaru Sasako
Kazufumi Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16575587A priority Critical patent/JPS6410243A/en
Publication of JPS6410243A publication Critical patent/JPS6410243A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To improve the gas permeability of a contrastenhanced film by applying a contrastenhanced material on a resist, followed by heating the formed film. CONSTITUTION:The resist 2 is applied on a substrate 1 of a semiconductor, etc., while rotating said substrate so as to have a thickness of 1.2mum. Next, the layer 3 of the contrastenhanced material is applied on the resist 2, and then, heated by a hot plate at 90 deg.C, for 2min, followed by selectively exposing said layer 3 through a mask 5 by means of a reducing projection exposure apparatus. At that time, a bubble does not generate at all, in the contrastenhanced layer 3. Thus, the gas permeability of said layer can be improved.
JP16575587A 1987-07-02 1987-07-02 Pattern forming method Pending JPS6410243A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16575587A JPS6410243A (en) 1987-07-02 1987-07-02 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16575587A JPS6410243A (en) 1987-07-02 1987-07-02 Pattern forming method

Publications (1)

Publication Number Publication Date
JPS6410243A true JPS6410243A (en) 1989-01-13

Family

ID=15818443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16575587A Pending JPS6410243A (en) 1987-07-02 1987-07-02 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS6410243A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8080364B2 (en) 2003-05-09 2011-12-20 Panasonic Corporation Pattern formation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8080364B2 (en) 2003-05-09 2011-12-20 Panasonic Corporation Pattern formation method

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