JPS63938B2 - - Google Patents
Info
- Publication number
- JPS63938B2 JPS63938B2 JP54090601A JP9060179A JPS63938B2 JP S63938 B2 JPS63938 B2 JP S63938B2 JP 54090601 A JP54090601 A JP 54090601A JP 9060179 A JP9060179 A JP 9060179A JP S63938 B2 JPS63938 B2 JP S63938B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- chamber
- growth
- preliminary
- gate valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9060179A JPS5615031A (en) | 1979-07-17 | 1979-07-17 | Molecular beam epitaxial growing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9060179A JPS5615031A (en) | 1979-07-17 | 1979-07-17 | Molecular beam epitaxial growing apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5615031A JPS5615031A (en) | 1981-02-13 |
JPS63938B2 true JPS63938B2 (enrdf_load_stackoverflow) | 1988-01-09 |
Family
ID=14002984
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9060179A Granted JPS5615031A (en) | 1979-07-17 | 1979-07-17 | Molecular beam epitaxial growing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5615031A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57207331A (en) * | 1981-06-15 | 1982-12-20 | Canon Inc | Manufacture of semiconductor device |
US4508590A (en) * | 1983-09-16 | 1985-04-02 | Raphael Kaplan | Method for the deposition of high-quality crystal epitaxial films of iron |
JPS6183699A (ja) * | 1984-09-28 | 1986-04-28 | Hitachi Ltd | 分子線エピタキシ装置 |
JPH035395A (ja) * | 1989-05-31 | 1991-01-11 | Hitachi Ltd | Mbe装置及びその運転方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3404661A (en) * | 1965-08-26 | 1968-10-08 | Sperry Rand Corp | Evaporation system |
-
1979
- 1979-07-17 JP JP9060179A patent/JPS5615031A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5615031A (en) | 1981-02-13 |
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