JPS638900Y2 - - Google Patents
Info
- Publication number
- JPS638900Y2 JPS638900Y2 JP1987061763U JP6176387U JPS638900Y2 JP S638900 Y2 JPS638900 Y2 JP S638900Y2 JP 1987061763 U JP1987061763 U JP 1987061763U JP 6176387 U JP6176387 U JP 6176387U JP S638900 Y2 JPS638900 Y2 JP S638900Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- metal
- transparent substrate
- metal mask
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 38
- 239000002184 metal Substances 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 description 5
- 239000005361 soda-lime glass Substances 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000005368 silicate glass Substances 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 229910005084 FexOy Inorganic materials 0.000 description 1
- 241000511976 Hoya Species 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- -1 silver halide compound Chemical class 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987061763U JPS638900Y2 (zh) | 1987-04-23 | 1987-04-23 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987061763U JPS638900Y2 (zh) | 1987-04-23 | 1987-04-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62179748U JPS62179748U (zh) | 1987-11-14 |
JPS638900Y2 true JPS638900Y2 (zh) | 1988-03-16 |
Family
ID=30895393
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1987061763U Expired JPS638900Y2 (zh) | 1987-04-23 | 1987-04-23 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS638900Y2 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7635544B2 (en) | 2004-09-13 | 2009-12-22 | Hoya Corporation | Transparent substrate for mask blank and mask blank |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4330443Y1 (zh) * | 1965-07-29 | 1968-12-12 | ||
JPS5217815A (en) * | 1975-07-30 | 1977-02-10 | Fuji Photo Film Co Ltd | Substrate and material using the same |
JPS5229063B2 (zh) * | 1973-07-16 | 1977-07-30 | ||
JPS52117553A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Circular mask |
JPS53117384A (en) * | 1977-03-23 | 1978-10-13 | Nec Corp | Photoetching mask |
JPS53128278A (en) * | 1977-04-14 | 1978-11-09 | Oki Electric Ind Co Ltd | Production of lsi mask |
JPS5421275A (en) * | 1977-07-19 | 1979-02-17 | Mitsubishi Electric Corp | Photo mask for semiconductor wafer manufacture |
JPS5562736A (en) * | 1978-11-01 | 1980-05-12 | Toshiba Corp | Mask material for preparation of semiconductor device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5229063U (zh) * | 1975-08-20 | 1977-03-01 | ||
JPS5628600Y2 (zh) * | 1976-11-30 | 1981-07-07 |
-
1987
- 1987-04-23 JP JP1987061763U patent/JPS638900Y2/ja not_active Expired
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4330443Y1 (zh) * | 1965-07-29 | 1968-12-12 | ||
JPS5229063B2 (zh) * | 1973-07-16 | 1977-07-30 | ||
JPS5217815A (en) * | 1975-07-30 | 1977-02-10 | Fuji Photo Film Co Ltd | Substrate and material using the same |
JPS52117553A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Circular mask |
JPS53117384A (en) * | 1977-03-23 | 1978-10-13 | Nec Corp | Photoetching mask |
JPS53128278A (en) * | 1977-04-14 | 1978-11-09 | Oki Electric Ind Co Ltd | Production of lsi mask |
JPS5421275A (en) * | 1977-07-19 | 1979-02-17 | Mitsubishi Electric Corp | Photo mask for semiconductor wafer manufacture |
JPS5562736A (en) * | 1978-11-01 | 1980-05-12 | Toshiba Corp | Mask material for preparation of semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7635544B2 (en) | 2004-09-13 | 2009-12-22 | Hoya Corporation | Transparent substrate for mask blank and mask blank |
Also Published As
Publication number | Publication date |
---|---|
JPS62179748U (zh) | 1987-11-14 |
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