JPS638643A - ポリマ材料層にパターンを形成する方法 - Google Patents

ポリマ材料層にパターンを形成する方法

Info

Publication number
JPS638643A
JPS638643A JP62110910A JP11091087A JPS638643A JP S638643 A JPS638643 A JP S638643A JP 62110910 A JP62110910 A JP 62110910A JP 11091087 A JP11091087 A JP 11091087A JP S638643 A JPS638643 A JP S638643A
Authority
JP
Japan
Prior art keywords
resist
leachable
irradiated
formulation
permeability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62110910A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0462661B2 (cg-RX-API-DMAC7.html
Inventor
スチーブン・エドワード・グレコ
クリストファー・フランシス・ライオンス
ジャー−ミング・ヤング
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS638643A publication Critical patent/JPS638643A/ja
Publication of JPH0462661B2 publication Critical patent/JPH0462661B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/26—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
JP62110910A 1986-06-23 1987-05-08 ポリマ材料層にパターンを形成する方法 Granted JPS638643A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US87760686A 1986-06-23 1986-06-23
US877606 1986-06-23

Publications (2)

Publication Number Publication Date
JPS638643A true JPS638643A (ja) 1988-01-14
JPH0462661B2 JPH0462661B2 (cg-RX-API-DMAC7.html) 1992-10-07

Family

ID=25370314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62110910A Granted JPS638643A (ja) 1986-06-23 1987-05-08 ポリマ材料層にパターンを形成する方法

Country Status (3)

Country Link
EP (1) EP0250762B1 (cg-RX-API-DMAC7.html)
JP (1) JPS638643A (cg-RX-API-DMAC7.html)
DE (1) DE3751127T2 (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0269746A (ja) * 1988-08-01 1990-03-08 Internatl Business Mach Corp <Ibm> ホトレジストの形成方法、ポリマー構造体、ホトレジスト
JPH02161432A (ja) * 1988-12-14 1990-06-21 Nec Corp 微細パターン形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60241225A (ja) * 1984-05-14 1985-11-30 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 陰画レジスト像を生成する方法
JPS61107346A (ja) * 1984-10-26 1986-05-26 ユセベ　エレクトロニックス，ソシエテ　アノニム フォトレジスト層中にネガ図形を形成する方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4198236A (en) * 1974-01-21 1980-04-15 E. I. Du Pont De Nemours And Company Method for preparation of lithographic printing plate having addition polymerized areas and binder areas
EP0014943A1 (en) * 1979-02-16 1980-09-03 Ardyth Dale Lakes Process for producing self-metering liquid retentive pad and other porous articles of manufacture
US4613398A (en) * 1985-06-06 1986-09-23 International Business Machines Corporation Formation of etch-resistant resists through preferential permeation
EP0244572B1 (en) * 1986-04-24 1990-09-05 International Business Machines Corporation Capped two-layer resist process

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60241225A (ja) * 1984-05-14 1985-11-30 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 陰画レジスト像を生成する方法
JPS61107346A (ja) * 1984-10-26 1986-05-26 ユセベ　エレクトロニックス，ソシエテ　アノニム フォトレジスト層中にネガ図形を形成する方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0269746A (ja) * 1988-08-01 1990-03-08 Internatl Business Mach Corp <Ibm> ホトレジストの形成方法、ポリマー構造体、ホトレジスト
JPH02161432A (ja) * 1988-12-14 1990-06-21 Nec Corp 微細パターン形成方法

Also Published As

Publication number Publication date
JPH0462661B2 (cg-RX-API-DMAC7.html) 1992-10-07
EP0250762A3 (en) 1988-10-05
EP0250762A2 (en) 1988-01-07
EP0250762B1 (en) 1995-03-08
DE3751127T2 (de) 1995-09-14
DE3751127D1 (de) 1995-04-13

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