JPS6386432A - 電子ビ−ム描画方法 - Google Patents

電子ビ−ム描画方法

Info

Publication number
JPS6386432A
JPS6386432A JP22985886A JP22985886A JPS6386432A JP S6386432 A JPS6386432 A JP S6386432A JP 22985886 A JP22985886 A JP 22985886A JP 22985886 A JP22985886 A JP 22985886A JP S6386432 A JPS6386432 A JP S6386432A
Authority
JP
Japan
Prior art keywords
size
current
dimension
value
dimensions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22985886A
Other languages
English (en)
Japanese (ja)
Other versions
JPH048938B2 (enrdf_load_stackoverflow
Inventor
Mamoru Nakasuji
護 中筋
Toshiya Muraguchi
要也 村口
Masami Ikeda
池田　正己
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Shibaura Machine Co Ltd
Original Assignee
Toshiba Corp
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Machine Co Ltd filed Critical Toshiba Corp
Priority to JP22985886A priority Critical patent/JPS6386432A/ja
Publication of JPS6386432A publication Critical patent/JPS6386432A/ja
Publication of JPH048938B2 publication Critical patent/JPH048938B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP22985886A 1986-09-30 1986-09-30 電子ビ−ム描画方法 Granted JPS6386432A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22985886A JPS6386432A (ja) 1986-09-30 1986-09-30 電子ビ−ム描画方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22985886A JPS6386432A (ja) 1986-09-30 1986-09-30 電子ビ−ム描画方法

Publications (2)

Publication Number Publication Date
JPS6386432A true JPS6386432A (ja) 1988-04-16
JPH048938B2 JPH048938B2 (enrdf_load_stackoverflow) 1992-02-18

Family

ID=16898794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22985886A Granted JPS6386432A (ja) 1986-09-30 1986-09-30 電子ビ−ム描画方法

Country Status (1)

Country Link
JP (1) JPS6386432A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6544698B1 (en) 2001-06-27 2003-04-08 University Of South Florida Maskless 2-D and 3-D pattern generation photolithography
US6764796B2 (en) 2001-06-27 2004-07-20 University Of South Florida Maskless photolithography using plasma displays
US6998219B2 (en) 2001-06-27 2006-02-14 University Of South Florida Maskless photolithography for etching and deposition
US7271877B2 (en) 2001-06-27 2007-09-18 University Of South Florida Method and apparatus for maskless photolithography

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6544698B1 (en) 2001-06-27 2003-04-08 University Of South Florida Maskless 2-D and 3-D pattern generation photolithography
US6764796B2 (en) 2001-06-27 2004-07-20 University Of South Florida Maskless photolithography using plasma displays
US6998219B2 (en) 2001-06-27 2006-02-14 University Of South Florida Maskless photolithography for etching and deposition
US7271877B2 (en) 2001-06-27 2007-09-18 University Of South Florida Method and apparatus for maskless photolithography
US7573561B2 (en) 2001-06-27 2009-08-11 University Of South Florida Method and apparatus for maskless photolithography
US7572573B2 (en) 2001-06-27 2009-08-11 University Of South Florida Maskless photolithography for etching and deposition

Also Published As

Publication number Publication date
JPH048938B2 (enrdf_load_stackoverflow) 1992-02-18

Similar Documents

Publication Publication Date Title
JPH0336299B2 (enrdf_load_stackoverflow)
DE102013211257A1 (de) Driftkorrekturverfahren und Muster-Schreibdaten-Erzeugungsverfahren
JPH11233401A (ja) 電子線描画方法及び電子線描画装置
US5404018A (en) Method of and an apparatus for charged particle beam exposure
US4763004A (en) Calibration method for electron beam exposer
JPS6386432A (ja) 電子ビ−ム描画方法
US5712488A (en) Electron beam performance measurement system and method thereof
JPH04269613A (ja) 荷電ビームの焦点合わせ方法
JP3282324B2 (ja) 荷電粒子ビーム露光方法
JPS5922325A (ja) 電子ビ−ム描画装置
JPH04303918A (ja) 荷電ビーム描画装置
JPH0414490B2 (enrdf_load_stackoverflow)
JPH03173119A (ja) 電子線描画装置
JP3157968B2 (ja) 荷電粒子ビーム露光方法
JP2000182937A (ja) 荷電粒子ビーム描画装置
JPH05299328A (ja) 荷電粒子ビーム露光方法及び装置
JP3450437B2 (ja) 電子ビーム露光方法、現像方法及び装置
JPS6221216A (ja) 電子ビ−ム露光装置
JPH07111943B2 (ja) 電子ビ−ム露光装置
JPH0423315A (ja) 電子ビーム描画装置
JP3313606B2 (ja) 電子線露光装置及び露光方法
JPS6312146A (ja) パタ−ン寸法計測方法
JPH04116915A (ja) 描画ビーム径調整方法
JPH0314219A (ja) 電子ビーム描画装置
JPH06104163A (ja) 電子線描画装置の焦点補正法

Legal Events

Date Code Title Description
S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313117

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313117

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

EXPY Cancellation because of completion of term