JPS6377344U - - Google Patents

Info

Publication number
JPS6377344U
JPS6377344U JP17244586U JP17244586U JPS6377344U JP S6377344 U JPS6377344 U JP S6377344U JP 17244586 U JP17244586 U JP 17244586U JP 17244586 U JP17244586 U JP 17244586U JP S6377344 U JPS6377344 U JP S6377344U
Authority
JP
Japan
Prior art keywords
wafer
handling jig
wafer handling
suck
peripheral edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17244586U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP17244586U priority Critical patent/JPS6377344U/ja
Publication of JPS6377344U publication Critical patent/JPS6377344U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】
第1図は本考案に係るウエハハンドリング治具
でウエハを吸着した状態の側面図、第2図は第1
図の平面図である。第3図はウエハハンドリング
治具が用いられる常圧CVD装置の概略構成図、
第4図及び第5図は従来例のウエハハンドリング
治具のそれぞれ断面図である。 1…真空チヤツク、2…吸引孔、4…ウエハハ
ンドリング治具、A…ウエハ。

Claims (1)

    【実用新案登録請求の範囲】
  1. 周縁部分を除いて所定のパターンが形成される
    ウエハの、非パターン形成部分のみを吸着する複
    数の真空チヤツクを備えたことを特徴とするウエ
    ハハンドリング治具。
JP17244586U 1986-11-10 1986-11-10 Pending JPS6377344U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17244586U JPS6377344U (ja) 1986-11-10 1986-11-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17244586U JPS6377344U (ja) 1986-11-10 1986-11-10

Publications (1)

Publication Number Publication Date
JPS6377344U true JPS6377344U (ja) 1988-05-23

Family

ID=31108986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17244586U Pending JPS6377344U (ja) 1986-11-10 1986-11-10

Country Status (1)

Country Link
JP (1) JPS6377344U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010161169A (ja) * 2009-01-07 2010-07-22 Ulvac Japan Ltd 真空処理装置、真空処理方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57194545A (en) * 1981-05-27 1982-11-30 Hitachi Ltd Attracting plate for wafer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57194545A (en) * 1981-05-27 1982-11-30 Hitachi Ltd Attracting plate for wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010161169A (ja) * 2009-01-07 2010-07-22 Ulvac Japan Ltd 真空処理装置、真空処理方法

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