JPS6376869A - スパツタ装置 - Google Patents

スパツタ装置

Info

Publication number
JPS6376869A
JPS6376869A JP22171486A JP22171486A JPS6376869A JP S6376869 A JPS6376869 A JP S6376869A JP 22171486 A JP22171486 A JP 22171486A JP 22171486 A JP22171486 A JP 22171486A JP S6376869 A JPS6376869 A JP S6376869A
Authority
JP
Japan
Prior art keywords
cathode
gas
target
discharge
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22171486A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0368111B2 (enrdf_load_stackoverflow
Inventor
Akiko Ito
明子 伊藤
Naoyuki Tamura
直行 田村
Hideaki Kanbara
秀明 蒲原
Yuichi Ishikawa
雄一 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP22171486A priority Critical patent/JPS6376869A/ja
Publication of JPS6376869A publication Critical patent/JPS6376869A/ja
Publication of JPH0368111B2 publication Critical patent/JPH0368111B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP22171486A 1986-09-19 1986-09-19 スパツタ装置 Granted JPS6376869A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22171486A JPS6376869A (ja) 1986-09-19 1986-09-19 スパツタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22171486A JPS6376869A (ja) 1986-09-19 1986-09-19 スパツタ装置

Publications (2)

Publication Number Publication Date
JPS6376869A true JPS6376869A (ja) 1988-04-07
JPH0368111B2 JPH0368111B2 (enrdf_load_stackoverflow) 1991-10-25

Family

ID=16771114

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22171486A Granted JPS6376869A (ja) 1986-09-19 1986-09-19 スパツタ装置

Country Status (1)

Country Link
JP (1) JPS6376869A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015166605A1 (ja) * 2014-04-28 2015-11-05 日新電機株式会社 成膜方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015166605A1 (ja) * 2014-04-28 2015-11-05 日新電機株式会社 成膜方法

Also Published As

Publication number Publication date
JPH0368111B2 (enrdf_load_stackoverflow) 1991-10-25

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