JPH0481325B2 - - Google Patents

Info

Publication number
JPH0481325B2
JPH0481325B2 JP57107794A JP10779482A JPH0481325B2 JP H0481325 B2 JPH0481325 B2 JP H0481325B2 JP 57107794 A JP57107794 A JP 57107794A JP 10779482 A JP10779482 A JP 10779482A JP H0481325 B2 JPH0481325 B2 JP H0481325B2
Authority
JP
Japan
Prior art keywords
gas
etching
discharge
electrode
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57107794A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58225637A (ja
Inventor
Yoshitsugu Nishimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP10779482A priority Critical patent/JPS58225637A/ja
Publication of JPS58225637A publication Critical patent/JPS58225637A/ja
Publication of JPH0481325B2 publication Critical patent/JPH0481325B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
JP10779482A 1982-06-23 1982-06-23 イオンビ−ム装置 Granted JPS58225637A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10779482A JPS58225637A (ja) 1982-06-23 1982-06-23 イオンビ−ム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10779482A JPS58225637A (ja) 1982-06-23 1982-06-23 イオンビ−ム装置

Publications (2)

Publication Number Publication Date
JPS58225637A JPS58225637A (ja) 1983-12-27
JPH0481325B2 true JPH0481325B2 (enrdf_load_stackoverflow) 1992-12-22

Family

ID=14468194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10779482A Granted JPS58225637A (ja) 1982-06-23 1982-06-23 イオンビ−ム装置

Country Status (1)

Country Link
JP (1) JPS58225637A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7247067B2 (en) 2003-06-12 2007-07-24 Yamaha Marine Kabushiki Kaisha Co., Ltd. Intake manifold for small watercraft
US7404293B2 (en) 2004-07-22 2008-07-29 Yamaha Marine Kabushiki Kaisha Intake system for supercharged engine
US7458868B2 (en) 2005-08-29 2008-12-02 Yamaha Marine Kabushiki Kaisha Small planing boat
US7458369B2 (en) 2004-09-14 2008-12-02 Yamaha Marine Kabushiki Kaisha Supercharger lubrication structure

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4761199A (en) * 1985-04-10 1988-08-02 Canon Kabushiki Kaisha Shutter device for ion beam etching apparatus and such etching apparatus using same
JPS63119237A (ja) * 1986-11-06 1988-05-23 Matsushita Electric Ind Co Ltd エツチング方法
KR20040046571A (ko) * 2002-11-27 2004-06-05 주식회사 피앤아이 이온빔을 이용한 재료의 표면 처리 장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52127167A (en) * 1976-04-19 1977-10-25 Fujitsu Ltd Etching method
JPS5368075A (en) * 1976-11-29 1978-06-17 Nec Corp Manufacture of element containing micro pattern
JPS5832417A (ja) * 1981-08-21 1983-02-25 Matsushita Electric Ind Co Ltd プラズマエツチング装置及びプラズマエツチング方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7247067B2 (en) 2003-06-12 2007-07-24 Yamaha Marine Kabushiki Kaisha Co., Ltd. Intake manifold for small watercraft
US7404293B2 (en) 2004-07-22 2008-07-29 Yamaha Marine Kabushiki Kaisha Intake system for supercharged engine
US7458369B2 (en) 2004-09-14 2008-12-02 Yamaha Marine Kabushiki Kaisha Supercharger lubrication structure
US7458868B2 (en) 2005-08-29 2008-12-02 Yamaha Marine Kabushiki Kaisha Small planing boat

Also Published As

Publication number Publication date
JPS58225637A (ja) 1983-12-27

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