JPS6359257B2 - - Google Patents
Info
- Publication number
- JPS6359257B2 JPS6359257B2 JP53050317A JP5031778A JPS6359257B2 JP S6359257 B2 JPS6359257 B2 JP S6359257B2 JP 53050317 A JP53050317 A JP 53050317A JP 5031778 A JP5031778 A JP 5031778A JP S6359257 B2 JPS6359257 B2 JP S6359257B2
- Authority
- JP
- Japan
- Prior art keywords
- polycrystalline silicon
- layer
- silicon layer
- metal layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D88/00—Three-dimensional [3D] integrated devices
Landscapes
- Bipolar Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5031778A JPS54141585A (en) | 1978-04-26 | 1978-04-26 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5031778A JPS54141585A (en) | 1978-04-26 | 1978-04-26 | Semiconductor integrated circuit device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54141585A JPS54141585A (en) | 1979-11-02 |
| JPS6359257B2 true JPS6359257B2 (en:Method) | 1988-11-18 |
Family
ID=12855516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5031778A Granted JPS54141585A (en) | 1978-04-26 | 1978-04-26 | Semiconductor integrated circuit device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54141585A (en:Method) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55148422A (en) * | 1979-05-09 | 1980-11-19 | Hitachi Ltd | Manufacturing of semiconductor device |
| JPS56121264U (en:Method) * | 1980-02-18 | 1981-09-16 | ||
| JPS59119756A (ja) * | 1982-12-25 | 1984-07-11 | Toshiba Corp | 半導体装置 |
| JPS60150678A (ja) * | 1984-01-18 | 1985-08-08 | Mitsubishi Electric Corp | 半導体装置の入力保護回路 |
| JPS61263254A (ja) * | 1985-05-17 | 1986-11-21 | Nec Corp | 入力保護装置 |
| JPH04355969A (ja) * | 1991-08-22 | 1992-12-09 | Rohm Co Ltd | 個別ダイオード装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4943574A (en:Method) * | 1972-08-30 | 1974-04-24 |
-
1978
- 1978-04-26 JP JP5031778A patent/JPS54141585A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54141585A (en) | 1979-11-02 |
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