JPS6355692B2 - - Google Patents

Info

Publication number
JPS6355692B2
JPS6355692B2 JP55185092A JP18509280A JPS6355692B2 JP S6355692 B2 JPS6355692 B2 JP S6355692B2 JP 55185092 A JP55185092 A JP 55185092A JP 18509280 A JP18509280 A JP 18509280A JP S6355692 B2 JPS6355692 B2 JP S6355692B2
Authority
JP
Japan
Prior art keywords
mask layer
parts
image
layer
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55185092A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57109944A (en
Inventor
Yoshiaki Shimizu
Nobumasa Sasa
Akira Nogami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP55185092A priority Critical patent/JPS57109944A/ja
Publication of JPS57109944A publication Critical patent/JPS57109944A/ja
Publication of JPS6355692B2 publication Critical patent/JPS6355692B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • G03F1/56Organic absorbers, e.g. of photo-resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP55185092A 1980-12-27 1980-12-27 Image forming material Granted JPS57109944A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55185092A JPS57109944A (en) 1980-12-27 1980-12-27 Image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55185092A JPS57109944A (en) 1980-12-27 1980-12-27 Image forming material

Publications (2)

Publication Number Publication Date
JPS57109944A JPS57109944A (en) 1982-07-08
JPS6355692B2 true JPS6355692B2 (en, 2012) 1988-11-04

Family

ID=16164694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55185092A Granted JPS57109944A (en) 1980-12-27 1980-12-27 Image forming material

Country Status (1)

Country Link
JP (1) JPS57109944A (en, 2012)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60184243A (ja) * 1984-03-02 1985-09-19 Kimoto & Co Ltd 感光性記録材料およびこれを用いる画像形成方法
JPS59188643A (ja) * 1983-04-08 1984-10-26 Kimoto & Co Ltd 感光性記録材料
JP2912140B2 (ja) * 1993-10-01 1999-06-28 株式会社きもと 製版用感光材料

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5289916A (en) * 1976-01-23 1977-07-28 Fuji Photo Film Co Ltd Image formation and material therefor

Also Published As

Publication number Publication date
JPS57109944A (en) 1982-07-08

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