JPS6354213B2 - - Google Patents

Info

Publication number
JPS6354213B2
JPS6354213B2 JP57210922A JP21092282A JPS6354213B2 JP S6354213 B2 JPS6354213 B2 JP S6354213B2 JP 57210922 A JP57210922 A JP 57210922A JP 21092282 A JP21092282 A JP 21092282A JP S6354213 B2 JPS6354213 B2 JP S6354213B2
Authority
JP
Japan
Prior art keywords
data
alignment
alignment mark
mark
memory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57210922A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59100528A (ja
Inventor
Naoki Ayada
Yasumi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP57210922A priority Critical patent/JPS59100528A/ja
Publication of JPS59100528A publication Critical patent/JPS59100528A/ja
Priority to US07/042,534 priority patent/US4794648A/en
Publication of JPS6354213B2 publication Critical patent/JPS6354213B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Multimedia (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57210922A 1982-10-25 1982-11-30 位置検知方法 Granted JPS59100528A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57210922A JPS59100528A (ja) 1982-11-30 1982-11-30 位置検知方法
US07/042,534 US4794648A (en) 1982-10-25 1987-04-27 Mask aligner with a wafer position detecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57210922A JPS59100528A (ja) 1982-11-30 1982-11-30 位置検知方法

Publications (2)

Publication Number Publication Date
JPS59100528A JPS59100528A (ja) 1984-06-09
JPS6354213B2 true JPS6354213B2 (US07754267-20100713-C00021.png) 1988-10-27

Family

ID=16597289

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57210922A Granted JPS59100528A (ja) 1982-10-25 1982-11-30 位置検知方法

Country Status (1)

Country Link
JP (1) JPS59100528A (US07754267-20100713-C00021.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0316550U (US07754267-20100713-C00021.png) * 1989-06-30 1991-02-19

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH021212A (ja) * 1989-03-17 1990-01-05 Canon Inc 眼科装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53105376A (en) * 1977-02-25 1978-09-13 Hitachi Ltd Positioning unit
JPS53132271A (en) * 1977-04-20 1978-11-17 Thomson Csf Thin semiconductor plate* method of positioning pattern projected to said plate in projector* and projector
JPS5434673A (en) * 1977-08-23 1979-03-14 Hitachi Ltd Micro-distance measuring device for scan-type electronic microscope
JPS5610780A (en) * 1979-07-06 1981-02-03 Matsushita Electric Ind Co Ltd Television receiving antenna unit for traveling-body mounting
JPS5729846A (en) * 1980-06-19 1982-02-17 Efubeeberuku Furitsu Buruumu G Device for transmitting pressure from inlet side of internal combustion engine to automatic change over gear

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53105376A (en) * 1977-02-25 1978-09-13 Hitachi Ltd Positioning unit
JPS53132271A (en) * 1977-04-20 1978-11-17 Thomson Csf Thin semiconductor plate* method of positioning pattern projected to said plate in projector* and projector
JPS5434673A (en) * 1977-08-23 1979-03-14 Hitachi Ltd Micro-distance measuring device for scan-type electronic microscope
JPS5610780A (en) * 1979-07-06 1981-02-03 Matsushita Electric Ind Co Ltd Television receiving antenna unit for traveling-body mounting
JPS5729846A (en) * 1980-06-19 1982-02-17 Efubeeberuku Furitsu Buruumu G Device for transmitting pressure from inlet side of internal combustion engine to automatic change over gear

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0316550U (US07754267-20100713-C00021.png) * 1989-06-30 1991-02-19

Also Published As

Publication number Publication date
JPS59100528A (ja) 1984-06-09

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