JPS6353123B2 - - Google Patents

Info

Publication number
JPS6353123B2
JPS6353123B2 JP54089683A JP8968379A JPS6353123B2 JP S6353123 B2 JPS6353123 B2 JP S6353123B2 JP 54089683 A JP54089683 A JP 54089683A JP 8968379 A JP8968379 A JP 8968379A JP S6353123 B2 JPS6353123 B2 JP S6353123B2
Authority
JP
Japan
Prior art keywords
film
substrate
silicon
gas
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54089683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5632317A (en
Inventor
Akio Hara
Nobuhiko Fujita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP8968379A priority Critical patent/JPS5632317A/ja
Publication of JPS5632317A publication Critical patent/JPS5632317A/ja
Publication of JPS6353123B2 publication Critical patent/JPS6353123B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP8968379A 1979-07-13 1979-07-13 Manufacture of amorphous silicon film Granted JPS5632317A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8968379A JPS5632317A (en) 1979-07-13 1979-07-13 Manufacture of amorphous silicon film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8968379A JPS5632317A (en) 1979-07-13 1979-07-13 Manufacture of amorphous silicon film

Publications (2)

Publication Number Publication Date
JPS5632317A JPS5632317A (en) 1981-04-01
JPS6353123B2 true JPS6353123B2 (enExample) 1988-10-21

Family

ID=13977555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8968379A Granted JPS5632317A (en) 1979-07-13 1979-07-13 Manufacture of amorphous silicon film

Country Status (1)

Country Link
JP (1) JPS5632317A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5730326A (en) * 1980-07-30 1982-02-18 Sekisui Chem Co Ltd Manufacture of thin film semiconductor

Also Published As

Publication number Publication date
JPS5632317A (en) 1981-04-01

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