JPS6351558B2 - - Google Patents
Info
- Publication number
- JPS6351558B2 JPS6351558B2 JP58104261A JP10426183A JPS6351558B2 JP S6351558 B2 JPS6351558 B2 JP S6351558B2 JP 58104261 A JP58104261 A JP 58104261A JP 10426183 A JP10426183 A JP 10426183A JP S6351558 B2 JPS6351558 B2 JP S6351558B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- conductivity type
- optical waveguide
- current blocking
- diffraction grating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 19
- 230000003287 optical effect Effects 0.000 claims description 14
- 230000000903 blocking effect Effects 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 7
- 238000005253 cladding Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- 239000013078 crystal Substances 0.000 description 7
- 230000010355 oscillation Effects 0.000 description 6
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Weting (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58104261A JPS59229889A (ja) | 1983-06-13 | 1983-06-13 | 半導体レ−ザ製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58104261A JPS59229889A (ja) | 1983-06-13 | 1983-06-13 | 半導体レ−ザ製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59229889A JPS59229889A (ja) | 1984-12-24 |
JPS6351558B2 true JPS6351558B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-10-14 |
Family
ID=14375983
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58104261A Granted JPS59229889A (ja) | 1983-06-13 | 1983-06-13 | 半導体レ−ザ製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59229889A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4902644A (en) * | 1986-03-28 | 1990-02-20 | American Telephone And Telegraph Company At&T Bell Laboratories | Preservation of surface features on semiconductor surfaces |
US5147825A (en) * | 1988-08-26 | 1992-09-15 | Bell Telephone Laboratories, Inc. | Photonic-integrated-circuit fabrication process |
JPH0719931B2 (ja) * | 1989-04-06 | 1995-03-06 | 三菱電機株式会社 | 半導体レーザ装置およびその製造方法 |
-
1983
- 1983-06-13 JP JP58104261A patent/JPS59229889A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59229889A (ja) | 1984-12-24 |