JPS6339897B2 - - Google Patents

Info

Publication number
JPS6339897B2
JPS6339897B2 JP54033207A JP3320779A JPS6339897B2 JP S6339897 B2 JPS6339897 B2 JP S6339897B2 JP 54033207 A JP54033207 A JP 54033207A JP 3320779 A JP3320779 A JP 3320779A JP S6339897 B2 JPS6339897 B2 JP S6339897B2
Authority
JP
Japan
Prior art keywords
mask
positioning
stopper
pattern
operating position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54033207A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55126251A (en
Inventor
Masahiro Okabe
Yoshitaka Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3320779A priority Critical patent/JPS55126251A/ja
Publication of JPS55126251A publication Critical patent/JPS55126251A/ja
Publication of JPS6339897B2 publication Critical patent/JPS6339897B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP3320779A 1979-03-23 1979-03-23 Mask positioning mechanism in transfer unit Granted JPS55126251A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3320779A JPS55126251A (en) 1979-03-23 1979-03-23 Mask positioning mechanism in transfer unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3320779A JPS55126251A (en) 1979-03-23 1979-03-23 Mask positioning mechanism in transfer unit

Publications (2)

Publication Number Publication Date
JPS55126251A JPS55126251A (en) 1980-09-29
JPS6339897B2 true JPS6339897B2 (enrdf_load_html_response) 1988-08-08

Family

ID=12380009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3320779A Granted JPS55126251A (en) 1979-03-23 1979-03-23 Mask positioning mechanism in transfer unit

Country Status (1)

Country Link
JP (1) JPS55126251A (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59121048A (ja) * 1982-12-27 1984-07-12 Ibiden Co Ltd プリント配線基板の製造装置

Also Published As

Publication number Publication date
JPS55126251A (en) 1980-09-29

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