JPS55126251A - Mask positioning mechanism in transfer unit - Google Patents
Mask positioning mechanism in transfer unitInfo
- Publication number
- JPS55126251A JPS55126251A JP3320779A JP3320779A JPS55126251A JP S55126251 A JPS55126251 A JP S55126251A JP 3320779 A JP3320779 A JP 3320779A JP 3320779 A JP3320779 A JP 3320779A JP S55126251 A JPS55126251 A JP S55126251A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- stoppers
- positioning
- fitting
- transfer unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3320779A JPS55126251A (en) | 1979-03-23 | 1979-03-23 | Mask positioning mechanism in transfer unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3320779A JPS55126251A (en) | 1979-03-23 | 1979-03-23 | Mask positioning mechanism in transfer unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55126251A true JPS55126251A (en) | 1980-09-29 |
JPS6339897B2 JPS6339897B2 (enrdf_load_html_response) | 1988-08-08 |
Family
ID=12380009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3320779A Granted JPS55126251A (en) | 1979-03-23 | 1979-03-23 | Mask positioning mechanism in transfer unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55126251A (enrdf_load_html_response) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59121048A (ja) * | 1982-12-27 | 1984-07-12 | Ibiden Co Ltd | プリント配線基板の製造装置 |
-
1979
- 1979-03-23 JP JP3320779A patent/JPS55126251A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59121048A (ja) * | 1982-12-27 | 1984-07-12 | Ibiden Co Ltd | プリント配線基板の製造装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6339897B2 (enrdf_load_html_response) | 1988-08-08 |
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