JPS6333702B2 - - Google Patents

Info

Publication number
JPS6333702B2
JPS6333702B2 JP4880284A JP4880284A JPS6333702B2 JP S6333702 B2 JPS6333702 B2 JP S6333702B2 JP 4880284 A JP4880284 A JP 4880284A JP 4880284 A JP4880284 A JP 4880284A JP S6333702 B2 JPS6333702 B2 JP S6333702B2
Authority
JP
Japan
Prior art keywords
coordinates
pattern
chip
stage
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4880284A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60192945A (ja
Inventor
Satoshi Araihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59048802A priority Critical patent/JPS60192945A/ja
Publication of JPS60192945A publication Critical patent/JPS60192945A/ja
Publication of JPS6333702B2 publication Critical patent/JPS6333702B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59048802A 1984-03-14 1984-03-14 マスク・プリント方法 Granted JPS60192945A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59048802A JPS60192945A (ja) 1984-03-14 1984-03-14 マスク・プリント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59048802A JPS60192945A (ja) 1984-03-14 1984-03-14 マスク・プリント方法

Publications (2)

Publication Number Publication Date
JPS60192945A JPS60192945A (ja) 1985-10-01
JPS6333702B2 true JPS6333702B2 (enrdf_load_stackoverflow) 1988-07-06

Family

ID=12813342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59048802A Granted JPS60192945A (ja) 1984-03-14 1984-03-14 マスク・プリント方法

Country Status (1)

Country Link
JP (1) JPS60192945A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0630334B2 (ja) * 1986-02-07 1994-04-20 キヤノン株式会社 露光方法
US4784182A (en) * 1987-10-05 1988-11-15 Nobuyuki Sugimura Bladder type accumulator associated with a sensor

Also Published As

Publication number Publication date
JPS60192945A (ja) 1985-10-01

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