JPS6331096B2 - - Google Patents
Info
- Publication number
- JPS6331096B2 JPS6331096B2 JP57111500A JP11150082A JPS6331096B2 JP S6331096 B2 JPS6331096 B2 JP S6331096B2 JP 57111500 A JP57111500 A JP 57111500A JP 11150082 A JP11150082 A JP 11150082A JP S6331096 B2 JPS6331096 B2 JP S6331096B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- semiconductor wafer
- auxiliary heating
- heating source
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
- H01L21/2686—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation using incoherent radiation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11150082A JPS593935A (ja) | 1982-06-30 | 1982-06-30 | 半導体ウエハ−を光照射で加熱する方法 |
| US06/445,492 US4468259A (en) | 1981-12-04 | 1982-11-30 | Uniform wafer heating by controlling light source and circumferential heating of wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11150082A JPS593935A (ja) | 1982-06-30 | 1982-06-30 | 半導体ウエハ−を光照射で加熱する方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS593935A JPS593935A (ja) | 1984-01-10 |
| JPS6331096B2 true JPS6331096B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-06-22 |
Family
ID=14562866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11150082A Granted JPS593935A (ja) | 1981-12-04 | 1982-06-30 | 半導体ウエハ−を光照射で加熱する方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS593935A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60167335U (ja) * | 1984-04-14 | 1985-11-06 | 大日本スクリ−ン製造株式会社 | 熱処理装置 |
| JPH02291118A (ja) * | 1988-12-30 | 1990-11-30 | Ag Processing Technol Inc | ウェハーの表面及び周囲加熱のための放射熱源を利用したウェハー均一加熱方法及びその装置 |
| US5310339A (en) * | 1990-09-26 | 1994-05-10 | Tokyo Electron Limited | Heat treatment apparatus having a wafer boat |
| CN114378751B (zh) | 2020-10-20 | 2022-11-01 | 长鑫存储技术有限公司 | 晶圆用承载环的安装夹具 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58175826A (ja) * | 1981-12-04 | 1983-10-15 | Ushio Inc | 半導体を光照射で加熱する方法 |
-
1982
- 1982-06-30 JP JP11150082A patent/JPS593935A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS593935A (ja) | 1984-01-10 |