JPS63296217A - 両面露光型マスクアライナのウエハ−吸着方法とその吸着構造 - Google Patents

両面露光型マスクアライナのウエハ−吸着方法とその吸着構造

Info

Publication number
JPS63296217A
JPS63296217A JP61246249A JP24624986A JPS63296217A JP S63296217 A JPS63296217 A JP S63296217A JP 61246249 A JP61246249 A JP 61246249A JP 24624986 A JP24624986 A JP 24624986A JP S63296217 A JPS63296217 A JP S63296217A
Authority
JP
Japan
Prior art keywords
wafer
mask
exposure
exposure mask
suction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61246249A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0533808B2 (enrdf_load_stackoverflow
Inventor
Takeshi Murai
剛 村井
Toshinori Konaka
敏典 小中
Noboru Kawahara
川原　昇
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M SETETSUKU KK
Original Assignee
M SETETSUKU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M SETETSUKU KK filed Critical M SETETSUKU KK
Priority to JP61246249A priority Critical patent/JPS63296217A/ja
Publication of JPS63296217A publication Critical patent/JPS63296217A/ja
Publication of JPH0533808B2 publication Critical patent/JPH0533808B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61246249A 1986-10-16 1986-10-16 両面露光型マスクアライナのウエハ−吸着方法とその吸着構造 Granted JPS63296217A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61246249A JPS63296217A (ja) 1986-10-16 1986-10-16 両面露光型マスクアライナのウエハ−吸着方法とその吸着構造

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61246249A JPS63296217A (ja) 1986-10-16 1986-10-16 両面露光型マスクアライナのウエハ−吸着方法とその吸着構造

Publications (2)

Publication Number Publication Date
JPS63296217A true JPS63296217A (ja) 1988-12-02
JPH0533808B2 JPH0533808B2 (enrdf_load_stackoverflow) 1993-05-20

Family

ID=17145718

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61246249A Granted JPS63296217A (ja) 1986-10-16 1986-10-16 両面露光型マスクアライナのウエハ−吸着方法とその吸着構造

Country Status (1)

Country Link
JP (1) JPS63296217A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009194147A (ja) * 2008-02-14 2009-08-27 Seiko Instruments Inc ウエハ露光装置及びウエハ露光方法
JP2010182997A (ja) * 2009-02-09 2010-08-19 Seiko Instruments Inc ウエハ露光装置及びウエハ露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009194147A (ja) * 2008-02-14 2009-08-27 Seiko Instruments Inc ウエハ露光装置及びウエハ露光方法
JP2010182997A (ja) * 2009-02-09 2010-08-19 Seiko Instruments Inc ウエハ露光装置及びウエハ露光方法

Also Published As

Publication number Publication date
JPH0533808B2 (enrdf_load_stackoverflow) 1993-05-20

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