JPH0533808B2 - - Google Patents

Info

Publication number
JPH0533808B2
JPH0533808B2 JP61246249A JP24624986A JPH0533808B2 JP H0533808 B2 JPH0533808 B2 JP H0533808B2 JP 61246249 A JP61246249 A JP 61246249A JP 24624986 A JP24624986 A JP 24624986A JP H0533808 B2 JPH0533808 B2 JP H0533808B2
Authority
JP
Japan
Prior art keywords
wafer
exposure
exposure mask
mask
lower exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61246249A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63296217A (ja
Inventor
Takeshi Murai
Toshinori Konaka
Noboru Kawahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M Setek Co Ltd
Original Assignee
M Setek Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M Setek Co Ltd filed Critical M Setek Co Ltd
Priority to JP61246249A priority Critical patent/JPS63296217A/ja
Publication of JPS63296217A publication Critical patent/JPS63296217A/ja
Publication of JPH0533808B2 publication Critical patent/JPH0533808B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61246249A 1986-10-16 1986-10-16 両面露光型マスクアライナのウエハ−吸着方法とその吸着構造 Granted JPS63296217A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61246249A JPS63296217A (ja) 1986-10-16 1986-10-16 両面露光型マスクアライナのウエハ−吸着方法とその吸着構造

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61246249A JPS63296217A (ja) 1986-10-16 1986-10-16 両面露光型マスクアライナのウエハ−吸着方法とその吸着構造

Publications (2)

Publication Number Publication Date
JPS63296217A JPS63296217A (ja) 1988-12-02
JPH0533808B2 true JPH0533808B2 (enrdf_load_stackoverflow) 1993-05-20

Family

ID=17145718

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61246249A Granted JPS63296217A (ja) 1986-10-16 1986-10-16 両面露光型マスクアライナのウエハ−吸着方法とその吸着構造

Country Status (1)

Country Link
JP (1) JPS63296217A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009194147A (ja) * 2008-02-14 2009-08-27 Seiko Instruments Inc ウエハ露光装置及びウエハ露光方法
JP2010182997A (ja) * 2009-02-09 2010-08-19 Seiko Instruments Inc ウエハ露光装置及びウエハ露光方法

Also Published As

Publication number Publication date
JPS63296217A (ja) 1988-12-02

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