JPS6328985B2 - - Google Patents
Info
- Publication number
- JPS6328985B2 JPS6328985B2 JP55056316A JP5631680A JPS6328985B2 JP S6328985 B2 JPS6328985 B2 JP S6328985B2 JP 55056316 A JP55056316 A JP 55056316A JP 5631680 A JP5631680 A JP 5631680A JP S6328985 B2 JPS6328985 B2 JP S6328985B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- target electrode
- sputtering
- thickness distribution
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000009826 distribution Methods 0.000 claims description 54
- 239000000758 substrate Substances 0.000 claims description 43
- 238000004544 sputter deposition Methods 0.000 claims description 31
- 239000010408 film Substances 0.000 description 72
- 238000010586 diagram Methods 0.000 description 9
- 238000000151 deposition Methods 0.000 description 8
- 230000008021 deposition Effects 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- 238000012937 correction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5631680A JPS56152963A (en) | 1980-04-30 | 1980-04-30 | Sputtering apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5631680A JPS56152963A (en) | 1980-04-30 | 1980-04-30 | Sputtering apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56152963A JPS56152963A (en) | 1981-11-26 |
| JPS6328985B2 true JPS6328985B2 (US20020051482A1-20020502-M00012.png) | 1988-06-10 |
Family
ID=13023744
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5631680A Granted JPS56152963A (en) | 1980-04-30 | 1980-04-30 | Sputtering apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56152963A (US20020051482A1-20020502-M00012.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0399291U (US20020051482A1-20020502-M00012.png) * | 1990-01-31 | 1991-10-16 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0699801B2 (ja) * | 1985-04-26 | 1994-12-07 | 松下電器産業株式会社 | 多成分薄膜の製造方法 |
| US4957605A (en) * | 1989-04-17 | 1990-09-18 | Materials Research Corporation | Method and apparatus for sputter coating stepped wafers |
| US7837836B2 (en) * | 2004-02-12 | 2010-11-23 | Seagate Technology Llc | Method and apparatus for multi-stage sputter deposition of uniform thickness layers |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5239851B2 (US20020051482A1-20020502-M00012.png) * | 1975-12-02 | 1977-10-07 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5239851U (US20020051482A1-20020502-M00012.png) * | 1975-09-11 | 1977-03-22 | ||
| JPS559634Y2 (US20020051482A1-20020502-M00012.png) * | 1976-02-20 | 1980-03-03 |
-
1980
- 1980-04-30 JP JP5631680A patent/JPS56152963A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5239851B2 (US20020051482A1-20020502-M00012.png) * | 1975-12-02 | 1977-10-07 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0399291U (US20020051482A1-20020502-M00012.png) * | 1990-01-31 | 1991-10-16 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56152963A (en) | 1981-11-26 |
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