JPS63270398A - 炭化珪素単結晶の成長方法 - Google Patents
炭化珪素単結晶の成長方法Info
- Publication number
- JPS63270398A JPS63270398A JP10290887A JP10290887A JPS63270398A JP S63270398 A JPS63270398 A JP S63270398A JP 10290887 A JP10290887 A JP 10290887A JP 10290887 A JP10290887 A JP 10290887A JP S63270398 A JPS63270398 A JP S63270398A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- silicon carbide
- carbide single
- substrate
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10290887A JPS63270398A (ja) | 1987-04-24 | 1987-04-24 | 炭化珪素単結晶の成長方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10290887A JPS63270398A (ja) | 1987-04-24 | 1987-04-24 | 炭化珪素単結晶の成長方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63270398A true JPS63270398A (ja) | 1988-11-08 |
JPH0443878B2 JPH0443878B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-07-17 |
Family
ID=14339956
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10290887A Granted JPS63270398A (ja) | 1987-04-24 | 1987-04-24 | 炭化珪素単結晶の成長方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63270398A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5363800A (en) * | 1991-06-12 | 1994-11-15 | The United States Of America As Represented By The United States National Aeronautics And Space Administration | Process for the controlled growth of single-crystal films of silicon carbide polytypes on silicon carbide wafers |
EP1130135A1 (en) * | 1999-10-08 | 2001-09-05 | Hoya Corporation | Silicon carbide film and method for manufacturing the same |
US6596080B2 (en) | 2000-04-07 | 2003-07-22 | Hoya Corporation | Silicon carbide and method for producing the same |
FR2854641A1 (fr) * | 2003-05-05 | 2004-11-12 | Centre Nat Rech Scient | Procede de formation d'une couche de carbure de silicium sur une tranche de silicium |
JP2013155111A (ja) * | 2013-05-07 | 2013-08-15 | Kwansei Gakuin | SiC基板、炭素供給フィード基板及び炭素ナノ材料付きSiC基板 |
-
1987
- 1987-04-24 JP JP10290887A patent/JPS63270398A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5363800A (en) * | 1991-06-12 | 1994-11-15 | The United States Of America As Represented By The United States National Aeronautics And Space Administration | Process for the controlled growth of single-crystal films of silicon carbide polytypes on silicon carbide wafers |
EP1130135A1 (en) * | 1999-10-08 | 2001-09-05 | Hoya Corporation | Silicon carbide film and method for manufacturing the same |
US6416578B1 (en) | 1999-10-08 | 2002-07-09 | Hoya Corporation | Silicon carbide film and method for manufacturing the same |
US6596080B2 (en) | 2000-04-07 | 2003-07-22 | Hoya Corporation | Silicon carbide and method for producing the same |
FR2854641A1 (fr) * | 2003-05-05 | 2004-11-12 | Centre Nat Rech Scient | Procede de formation d'une couche de carbure de silicium sur une tranche de silicium |
WO2004099471A3 (fr) * | 2003-05-05 | 2005-01-20 | Centre Nat Recherche | Procede de formation d’une couche de carbure de silicium sur une tranche de silicium |
US7416606B2 (en) | 2003-05-05 | 2008-08-26 | Centre National De La Recherche Scientifique | Method of forming a layer of silicon carbide on a silicon wafer |
JP2013155111A (ja) * | 2013-05-07 | 2013-08-15 | Kwansei Gakuin | SiC基板、炭素供給フィード基板及び炭素ナノ材料付きSiC基板 |
Also Published As
Publication number | Publication date |
---|---|
JPH0443878B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-07-17 |