JPS6322576B2 - - Google Patents
Info
- Publication number
- JPS6322576B2 JPS6322576B2 JP9299284A JP9299284A JPS6322576B2 JP S6322576 B2 JPS6322576 B2 JP S6322576B2 JP 9299284 A JP9299284 A JP 9299284A JP 9299284 A JP9299284 A JP 9299284A JP S6322576 B2 JPS6322576 B2 JP S6322576B2
- Authority
- JP
- Japan
- Prior art keywords
- nitrocellulose
- polymer
- layer
- refractive index
- outermost
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920001220 nitrocellulos Polymers 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 39
- 239000000020 Nitrocellulose Substances 0.000 claims description 36
- 229920000642 polymer Polymers 0.000 claims description 36
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 230000003667 anti-reflective effect Effects 0.000 claims description 5
- 238000004528 spin coating Methods 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 60
- 239000010408 film Substances 0.000 description 40
- 238000002834 transmittance Methods 0.000 description 31
- 239000000428 dust Substances 0.000 description 12
- 239000012528 membrane Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 230000003595 spectral effect Effects 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 229920001897 terpolymer Polymers 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 4
- 238000005266 casting Methods 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004695 Polyether sulfone Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920006393 polyether sulfone Polymers 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- 229920005573 silicon-containing polymer Polymers 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- -1 For example Polymers 0.000 description 1
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000002079 cooperative effect Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920002577 polybenzoxazole Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920006027 ternary co-polymer Polymers 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- BUGOPWGPQGYYGR-UHFFFAOYSA-N thiane 1,1-dioxide Chemical compound O=S1(=O)CCCCC1 BUGOPWGPQGYYGR-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59092992A JPS60237450A (ja) | 1984-05-11 | 1984-05-11 | 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59092992A JPS60237450A (ja) | 1984-05-11 | 1984-05-11 | 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60237450A JPS60237450A (ja) | 1985-11-26 |
| JPS6322576B2 true JPS6322576B2 (US06174465-20010116-C00003.png) | 1988-05-12 |
Family
ID=14069859
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59092992A Granted JPS60237450A (ja) | 1984-05-11 | 1984-05-11 | 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60237450A (US06174465-20010116-C00003.png) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4759990A (en) * | 1985-11-27 | 1988-07-26 | Yen Yung Tsai | Composite optical element including anti-reflective coating |
| JPH0529473Y2 (US06174465-20010116-C00003.png) * | 1986-03-14 | 1993-07-28 | ||
| JPH0529474Y2 (US06174465-20010116-C00003.png) * | 1986-03-14 | 1993-07-28 | ||
| JPH0644148B2 (ja) * | 1986-06-25 | 1994-06-08 | ダイセル化学工業株式会社 | 反射防止コ−テツドペリクルの製法 |
| JP2535971B2 (ja) * | 1987-11-05 | 1996-09-18 | 三井石油化学工業株式会社 | ペリクル |
| CA2005096C (en) * | 1988-12-13 | 1999-03-23 | Tokinori Agou | High light-transmissive dust-proof body and method of preparing same |
| JP2733483B2 (ja) * | 1988-12-13 | 1998-03-30 | 三井化学株式会社 | 高光線透過性防塵体の製造方法 |
| US5061024C1 (en) * | 1989-09-06 | 2002-02-26 | Dupont Photomasks Inc | Amorphous fluoropolymer pellicle films |
| US6926952B1 (en) | 1998-01-13 | 2005-08-09 | 3M Innovative Properties Company | Anti-reflective polymer constructions and method for producing same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5846301A (ja) * | 1981-09-14 | 1983-03-17 | Toray Ind Inc | 反射防止膜を有する透明材料 |
-
1984
- 1984-05-11 JP JP59092992A patent/JPS60237450A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5846301A (ja) * | 1981-09-14 | 1983-03-17 | Toray Ind Inc | 反射防止膜を有する透明材料 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60237450A (ja) | 1985-11-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4657805A (en) | Dust cover superior in transparency for photomask reticle use and process for producing the same | |
| US4861402A (en) | Method of making a cellulose acetate butyrate pellicle | |
| US5061024A (en) | Amorphous fluoropolymer pellicle films | |
| US5168001A (en) | Perfluoropolymer coated pellicle | |
| JPS6322576B2 (US06174465-20010116-C00003.png) | ||
| JPH0367262A (ja) | 汚染防止保護器具 | |
| JPS6325658B2 (US06174465-20010116-C00003.png) | ||
| US6582859B2 (en) | Dust cover for use in semiconductor fabrication | |
| US7416820B2 (en) | Pellicle film optimized for immersion lithography systems with NA>1 | |
| US20090042107A1 (en) | Pellicle for high numerical aperture exposure device | |
| JP2817884B2 (ja) | 反射防止薄膜 | |
| JPH0339963A (ja) | ペリクル | |
| US4796973A (en) | Pellicle structure for transmission of mid ultraviolet light | |
| JPH06230560A (ja) | ペリクル | |
| JP3302268B2 (ja) | ペリクルの製造方法 | |
| JPS6153601A (ja) | 高性能なフオトマスク・レチクル用防塵カバ−体 | |
| JP2790850B2 (ja) | ペリクル用セルロース薄膜 | |
| JP3026750B2 (ja) | ペリクル | |
| JP3088783B2 (ja) | 高透過性ペリクル | |
| JP3032250B2 (ja) | 耐光性に優れたペリクル | |
| JP2871757B2 (ja) | ペリクル | |
| JPH0481854A (ja) | ｇ線、ｉ線共用ペリクル | |
| GB2165545A (en) | Pellicle structure for transmission of mid ultraviolet light | |
| JPH0511437A (ja) | フオトマスク防塵用フイルムカバー | |
| JPH02158735A (ja) | 高光線透過性防塵体 |
