JPS6321573Y2 - - Google Patents
Info
- Publication number
- JPS6321573Y2 JPS6321573Y2 JP1982196639U JP19663982U JPS6321573Y2 JP S6321573 Y2 JPS6321573 Y2 JP S6321573Y2 JP 1982196639 U JP1982196639 U JP 1982196639U JP 19663982 U JP19663982 U JP 19663982U JP S6321573 Y2 JPS6321573 Y2 JP S6321573Y2
- Authority
- JP
- Japan
- Prior art keywords
- pipe system
- chamber
- sputtering
- gas introduction
- main gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP19663982U JPS59100855U (ja) | 1982-12-24 | 1982-12-24 | 連続スパツタ装置 | 
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| JP19663982U JPS59100855U (ja) | 1982-12-24 | 1982-12-24 | 連続スパツタ装置 | 
Publications (2)
| Publication Number | Publication Date | 
|---|---|
| JPS59100855U JPS59100855U (ja) | 1984-07-07 | 
| JPS6321573Y2 true JPS6321573Y2 (OSRAM) | 1988-06-14 | 
Family
ID=30421766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| JP19663982U Granted JPS59100855U (ja) | 1982-12-24 | 1982-12-24 | 連続スパツタ装置 | 
Country Status (1)
| Country | Link | 
|---|---|
| JP (1) | JPS59100855U (OSRAM) | 
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| JPS5119100Y2 (OSRAM) * | 1972-06-27 | 1976-05-20 | ||
| JPS56130470A (en) * | 1980-03-14 | 1981-10-13 | Hitachi Ltd | Sputtering apparatus | 
- 
        1982
        - 1982-12-24 JP JP19663982U patent/JPS59100855U/ja active Granted
 
Also Published As
| Publication number | Publication date | 
|---|---|
| JPS59100855U (ja) | 1984-07-07 | 
Similar Documents
| Publication | Publication Date | Title | 
|---|---|---|
| JP3332053B2 (ja) | チャンバーへのガス供給方法 | |
| US6039770A (en) | Semiconductor device manufacturing system having means for reducing a pressure difference between loadlock and processing chambers | |
| EP0539225A1 (en) | Semiconductor fabrication | |
| JPH0242186A (ja) | ブースターポンプのための制御バイパス | |
| SG38929A1 (en) | High flow gas manifold for high rate off-axis sputter deposition | |
| KR970067539A (ko) | 기판처리장치 | |
| JPH06244125A (ja) | 減圧処理装置 | |
| JPS6321573Y2 (OSRAM) | ||
| JPH0118152B2 (OSRAM) | ||
| JP4521889B2 (ja) | 基板処理装置 | |
| JP2826479B2 (ja) | ガス供給装置及びその操作方法 | |
| US4865713A (en) | Apparatus for applying thin layers onto a substrate | |
| JPS59133365A (ja) | 真空装置 | |
| US20050145181A1 (en) | Method and apparatus for high speed atomic layer deposition | |
| JP2650105B2 (ja) | ガス制御装置 | |
| JP3347794B2 (ja) | 半導体製造装置 | |
| JPH0342037Y2 (OSRAM) | ||
| JPH068380Y2 (ja) | 真空ポンプ用バルブ | |
| JP2646998B2 (ja) | 真空処理方法 | |
| JPH11302849A (ja) | 成膜装置 | |
| JPH0444613Y2 (OSRAM) | ||
| JP2827911B2 (ja) | ガス制御装置 | |
| JP2558385B2 (ja) | 真空装置 | |
| JPS5881975A (ja) | プラズマエツチング装置及びその類似装置のガスライン排気系 | |
| JP2712250B2 (ja) | ガスソースmbe装置 |