JPS632138B2 - - Google Patents

Info

Publication number
JPS632138B2
JPS632138B2 JP12471482A JP12471482A JPS632138B2 JP S632138 B2 JPS632138 B2 JP S632138B2 JP 12471482 A JP12471482 A JP 12471482A JP 12471482 A JP12471482 A JP 12471482A JP S632138 B2 JPS632138 B2 JP S632138B2
Authority
JP
Japan
Prior art keywords
absorber layer
ray
layer
exposure mask
ray exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12471482A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5914638A (ja
Inventor
Hideo Yoshihara
Akira Ozawa
Misao Sekimoto
Toshiro Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP57124714A priority Critical patent/JPS5914638A/ja
Priority to US06/513,954 priority patent/US4515876A/en
Priority to DE19833325832 priority patent/DE3325832A1/de
Priority to FR8311817A priority patent/FR2542882B1/fr
Publication of JPS5914638A publication Critical patent/JPS5914638A/ja
Publication of JPS632138B2 publication Critical patent/JPS632138B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57124714A 1982-07-17 1982-07-17 Ｘ線露光用マスクの製法 Granted JPS5914638A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57124714A JPS5914638A (ja) 1982-07-17 1982-07-17 Ｘ線露光用マスクの製法
US06/513,954 US4515876A (en) 1982-07-17 1983-07-15 X-Ray lithography mask and method for fabricating the same
DE19833325832 DE3325832A1 (de) 1982-07-17 1983-07-18 Roentgenstrahlenlithographie-maske und verfahren zu seiner herstellung
FR8311817A FR2542882B1 (fr) 1982-07-17 1983-07-18 Masque de lithographie a rayons x et procede de fabrication de celui-ci

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57124714A JPS5914638A (ja) 1982-07-17 1982-07-17 Ｘ線露光用マスクの製法

Publications (2)

Publication Number Publication Date
JPS5914638A JPS5914638A (ja) 1984-01-25
JPS632138B2 true JPS632138B2 (enExample) 1988-01-18

Family

ID=14892285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57124714A Granted JPS5914638A (ja) 1982-07-17 1982-07-17 Ｘ線露光用マスクの製法

Country Status (1)

Country Link
JP (1) JPS5914638A (enExample)

Also Published As

Publication number Publication date
JPS5914638A (ja) 1984-01-25

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