JPS6321341B2 - - Google Patents
Info
- Publication number
- JPS6321341B2 JPS6321341B2 JP53007279A JP727978A JPS6321341B2 JP S6321341 B2 JPS6321341 B2 JP S6321341B2 JP 53007279 A JP53007279 A JP 53007279A JP 727978 A JP727978 A JP 727978A JP S6321341 B2 JPS6321341 B2 JP S6321341B2
- Authority
- JP
- Japan
- Prior art keywords
- gate
- mos
- diffusion layer
- dummy
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 14
- 238000009792 diffusion process Methods 0.000 claims description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 7
- 229920005591 polysilicon Polymers 0.000 claims description 7
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 238000002161 passivation Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000011109 contamination Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
- H01L27/0705—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
- H01L27/0727—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with diodes, or capacitors or resistors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP727978A JPS54101294A (en) | 1978-01-27 | 1978-01-27 | Dummy mos semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP727978A JPS54101294A (en) | 1978-01-27 | 1978-01-27 | Dummy mos semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54101294A JPS54101294A (en) | 1979-08-09 |
JPS6321341B2 true JPS6321341B2 (ko) | 1988-05-06 |
Family
ID=11661580
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP727978A Granted JPS54101294A (en) | 1978-01-27 | 1978-01-27 | Dummy mos semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54101294A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02141025U (ko) * | 1989-04-25 | 1990-11-27 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60177640A (ja) * | 1984-02-24 | 1985-09-11 | Hitachi Ltd | 半導体集積回路装置 |
JPH05275692A (ja) * | 1992-03-25 | 1993-10-22 | Sony Corp | 半導体装置およびその製造方法 |
JP2006024601A (ja) * | 2004-07-06 | 2006-01-26 | Seiko Instruments Inc | 電界効果型mosトランジスタ |
-
1978
- 1978-01-27 JP JP727978A patent/JPS54101294A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02141025U (ko) * | 1989-04-25 | 1990-11-27 |
Also Published As
Publication number | Publication date |
---|---|
JPS54101294A (en) | 1979-08-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3999212A (en) | Field effect semiconductor device having a protective diode | |
JP3041043B2 (ja) | パワーmosfetトランジスタ回路 | |
US4377819A (en) | Semiconductor device | |
US4963970A (en) | Vertical MOSFET device having protector | |
US4067099A (en) | Method of forming passivation film | |
JPH07153920A (ja) | 半導体装置 | |
KR100214855B1 (ko) | 정전기 방지용 트랜지스터 및 그의 제조방법 | |
JPH11261010A (ja) | 半導体装置及びその製造方法 | |
US4438449A (en) | Field effect semiconductor device having a protective diode with reduced internal resistance | |
JPS6321341B2 (ko) | ||
EP0246139B1 (fr) | Dispositif de protection d'entrée pour circuits intégrés en technologie CMOS | |
US4060827A (en) | Semiconductor device and a method of making the same | |
JPS609159A (ja) | 半導体装置 | |
JP2001044414A (ja) | 半導体装置 | |
JP2000156408A (ja) | 半導体装置及びその製造方法 | |
JPS6359257B2 (ko) | ||
JP2748938B2 (ja) | 半導体集積回路装置 | |
JPS629228B2 (ko) | ||
JPS5834943A (ja) | 半導体装置の製造方法 | |
JP2924223B2 (ja) | 熱電対素子 | |
JPH0213829B2 (ko) | ||
JP2776569B2 (ja) | 半導体装置 | |
JPH0710499Y2 (ja) | 可変容量ダイオ−ド装置 | |
JP2536423B2 (ja) | 半導体装置の製造方法 | |
JPH09252118A (ja) | 半導体装置およびその製造方法 |