JPS6319860B2 - - Google Patents

Info

Publication number
JPS6319860B2
JPS6319860B2 JP59032840A JP3284084A JPS6319860B2 JP S6319860 B2 JPS6319860 B2 JP S6319860B2 JP 59032840 A JP59032840 A JP 59032840A JP 3284084 A JP3284084 A JP 3284084A JP S6319860 B2 JPS6319860 B2 JP S6319860B2
Authority
JP
Japan
Prior art keywords
plate
pattern
latent image
hole pattern
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59032840A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60176040A (ja
Inventor
Takuro Sen
Kazuo Shirakawa
Naomi Nakayama
Katsujiro Waki
Hideki Awano
Masahiko Matsuyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP59032840A priority Critical patent/JPS60176040A/ja
Publication of JPS60176040A publication Critical patent/JPS60176040A/ja
Publication of JPS6319860B2 publication Critical patent/JPS6319860B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
JP59032840A 1984-02-23 1984-02-23 シヤドウマスク用パタ−ン版の製造方法 Granted JPS60176040A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59032840A JPS60176040A (ja) 1984-02-23 1984-02-23 シヤドウマスク用パタ−ン版の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59032840A JPS60176040A (ja) 1984-02-23 1984-02-23 シヤドウマスク用パタ−ン版の製造方法

Publications (2)

Publication Number Publication Date
JPS60176040A JPS60176040A (ja) 1985-09-10
JPS6319860B2 true JPS6319860B2 (enrdf_load_stackoverflow) 1988-04-25

Family

ID=12370016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59032840A Granted JPS60176040A (ja) 1984-02-23 1984-02-23 シヤドウマスク用パタ−ン版の製造方法

Country Status (1)

Country Link
JP (1) JPS60176040A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4107762B4 (de) * 1990-03-09 2006-07-13 Dai Nippon Printing Co., Ltd. Verfahren zum Herstellen von Master- und Arbeitsmusterplatten für den Ätzprozess

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5112986B2 (enrdf_load_stackoverflow) * 1972-10-04 1976-04-23
JPS5355218A (en) * 1976-10-27 1978-05-19 Tokyo Shibaura Electric Co Positioning method of multiilaminated printing
JPS5835538A (ja) * 1981-08-27 1983-03-02 Mitsubishi Electric Corp パタ−ンマスクの作製方法

Also Published As

Publication number Publication date
JPS60176040A (ja) 1985-09-10

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